CF4 PLASMA-ETCHING ON LINBO3
| dc.citation.epage | 758 | en_US |
| dc.citation.issue | 10 | en_US |
| dc.citation.spage | 756 | en_US |
| dc.citation.volume | 35 | en_US |
| dc.citation.woscount | 29 | |
| dc.contributor.author | LEE, CL | en_US |
| dc.contributor.author | LU, CL | en_US |
| dc.contributor.department | 交大名義發表 | zh_TW |
| dc.contributor.department | 電控工程研究所 | zh_TW |
| dc.contributor.department | National Chiao Tung University | en_US |
| dc.contributor.department | Institute of Electrical and Control Engineering | en_US |
| dc.date.accessioned | 2014-12-08T15:06:31Z | |
| dc.date.available | 2014-12-08T15:06:31Z | |
| dc.date.issued | 1979 | en_US |
| dc.identifier.doi | 10.1063/1.90959 | en_US |
| dc.identifier.issn | 0003-6951 | en_US |
| dc.identifier.journal | APPLIED PHYSICS LETTERS | en_US |
| dc.identifier.uri | http://dx.doi.org/10.1063/1.90959 | en_US |
| dc.identifier.uri | https://ir.lib.nycu.edu.tw/handle/11536/5088 | |
| dc.identifier.wosnumber | WOS:A1979HV84900013 | |
| dc.language.iso | en_US | en_US |
| dc.title | CF4 PLASMA-ETCHING ON LINBO3 | en_US |
| dc.type | Article | en_US |
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