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學術出版;;Publications
會議論文;;Conferences Paper
Reactive ion etching of compound semiconductors grown by MOCVD technique with BCl3/SF6/Ar mixtures
Reactive ion etching of compound semiconductors grown by MOCVD technique with BCl3/SF6/Ar mixtures
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Date
1995
Authors
Chang, KM
Tsai, JY
Yeh, CB
Yeh, TH
Wang, SW
Jou, MJ
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https://ir.lib.nycu.edu.tw/handle/11536/19963
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會議論文;;Conferences Paper
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