Synchrotron Radiation Soft X-ray Induced Reduction in Graphene Oxide Characterized by Time-Resolved Photoelectron Spectroscopy

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dc.citation.epage12915en_US
dc.citation.issue23en_US
dc.citation.spage12910en_US
dc.citation.volume119en_US
dc.citation.woscount0en_US
dc.contributor.authorLin, Chi-Yuanen_US
dc.contributor.authorCheng, Cheng-Enen_US
dc.contributor.authorWang, Shuaien_US
dc.contributor.authorShiu, Hung Weien_US
dc.contributor.authorChang, Lo Yuehen_US
dc.contributor.authorChen, Chia-Haoen_US
dc.contributor.authorLin, Tsung-Wuen_US
dc.contributor.authorChang, Chen-Shiungen_US
dc.contributor.authorChien, Forest Shih-Senen_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.date.accessioned2015-12-02T02:59:11Z
dc.date.available2015-12-02T02:59:11Z
dc.date.issued2015-06-11en_US
dc.description.abstractSynchrotron radiation soft X-ray was employed to reduce graphene oxide (GO) films in ultrahigh vacuum. The dissociation of oxygen-containing functional groups, and the formation of sp(2) C-C bonds were revealed by time-resolved in situ X-ray photoelectron spectroscopy, demonstrating the X-ray reduction of GO. The number of C-O bonds of G-O exhibited an exponential decay with exposure time. The X-ray reduction rate of G-O was positively correlated with the intensity of low-energy secondary electrons excited from substrates by soft X-ray, indicating the C-O bonds were dissociated by secondary electrons.en_US
dc.identifier.doi10.1021/jp512055gen_US
dc.identifier.issn1932-7447en_US
dc.identifier.journalJOURNAL OF PHYSICAL CHEMISTRY Cen_US
dc.identifier.urihttp://dx.doi.org/10.1021/jp512055gen_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/127892
dc.identifier.wosnumberWOS:000356317500015en_US
dc.language.isoen_USen_US
dc.titleSynchrotron Radiation Soft X-ray Induced Reduction in Graphene Oxide Characterized by Time-Resolved Photoelectron Spectroscopyen_US
dc.typeArticleen_US

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