ELLIPSOMETRIC MEASUREMENTS AND ITS ALIGNMENT - USING THE INTENSITY RATIO TECHNIQUE
| dc.citation.epage | 5019 | en_US |
| dc.citation.issue | 9A | en_US |
| dc.citation.spage | 5016 | en_US |
| dc.citation.volume | 34 | en_US |
| dc.citation.woscount | 9 | |
| dc.contributor.author | CHAO, YF | en_US |
| dc.contributor.author | WEI, CS | en_US |
| dc.contributor.author | LEE, WC | en_US |
| dc.contributor.author | LIN, SC | en_US |
| dc.contributor.author | CHAO, TS | en_US |
| dc.contributor.department | 交大名義發表 | zh_TW |
| dc.contributor.department | National Chiao Tung University | en_US |
| dc.date.accessioned | 2014-12-08T15:03:12Z | |
| dc.date.available | 2014-12-08T15:03:12Z | |
| dc.date.issued | 1995-09-01 | en_US |
| dc.description.abstract | Using first-order treatment on azimuth errors of the polarizer (P) and analyzer (A) with respect to the plane of incidence (POI), we construct two intensity ratios around a certain configuration: such as P = +/- pi/4 and A = 0 as compared to A = pi/2. These expressions can be used not only to align the azimuths of the polarizer and analyzer to the POI, hut also to obtain the ellipsometric parameter phi without locating the minimum intensity, BK7 glass and SiO2/Si thin film are ultilized to evaluate this technique. | en_US |
| dc.identifier.doi | 10.1143/JJAP.34.5016 | en_US |
| dc.identifier.issn | 0021-4922 | en_US |
| dc.identifier.journal | JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | en_US |
| dc.identifier.uri | http://dx.doi.org/10.1143/JJAP.34.5016 | en_US |
| dc.identifier.uri | https://ir.lib.nycu.edu.tw/handle/11536/1764 | |
| dc.identifier.wosnumber | WOS:A1995RX26800080 | |
| dc.language.iso | en_US | en_US |
| dc.subject | ELLIPSOMETRY | en_US |
| dc.subject | POLARIMETRY | en_US |
| dc.subject | REFRACTIVE INDEX | en_US |
| dc.subject | THIN FILM | en_US |
| dc.title | ELLIPSOMETRIC MEASUREMENTS AND ITS ALIGNMENT - USING THE INTENSITY RATIO TECHNIQUE | en_US |
| dc.type | Article | en_US |