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學術出版;;Publications
會議論文;;Conferences Paper
Impacts of precursor flow rate and temperature of PECVD-SiN capping films on strained-channel NMOSFETs
Impacts of precursor flow rate and temperature of PECVD-SiN capping films on strained-channel NMOSFETs
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Date
2007
Authors
Lu, Ching-Sen
Lin, Horng-Chih
Lee, Yao-Jen
Huang, Tiao-Yuan
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https://ir.lib.nycu.edu.tw/handle/11536/12067
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會議論文;;Conferences Paper
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