<link rel="stylesheet" href="styles.cf390c6bfbe7555f.css"> Skip to main content

ELLIPSOMETRY MEASUREMENTS ON SIO2-FILMS FOR THICKNESSES UNDER 200-A

dc.citation.epage981en_US
dc.citation.issue9en_US
dc.citation.spage973en_US
dc.citation.volume30en_US
dc.citation.woscount26
dc.contributor.authorHO, JHen_US
dc.contributor.authorLEE, CLen_US
dc.contributor.authorJEN, CWen_US
dc.contributor.authorLEI, TFen_US
dc.contributor.department交大名義發表zh_TW
dc.contributor.department電控工程研究所zh_TW
dc.contributor.departmentNational Chiao Tung Universityen_US
dc.contributor.departmentInstitute of Electrical and Control Engineeringen_US
dc.date.accessioned2014-12-08T15:06:03Z
dc.date.available2014-12-08T15:06:03Z
dc.date.issued1987-09-01en_US
dc.identifier.issn0038-1101en_US
dc.identifier.journalSOLID-STATE ELECTRONICSen_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/4621
dc.identifier.wosnumberWOS:A1987K009500012
dc.language.isoen_USen_US
dc.titleELLIPSOMETRY MEASUREMENTS ON SIO2-FILMS FOR THICKNESSES UNDER 200-Aen_US
dc.typeArticleen_US

Files

License bundle

Now showing 1 - 1 of 1
Loading...
Thumbnail Image
Name:
license.txt
Size:
1.71 KB
Format:
Item-specific license agreed to upon submission
Description: