CHARACTERIZATION OF MONOLITHIC POLYCRYSTALLINE-SILICON RESISTORS IN SUB-MICRON THICKNESS
| dc.citation.epage | C331 | en_US |
| dc.citation.issue | 8 | en_US |
| dc.citation.spage | C331 | en_US |
| dc.citation.volume | 129 | en_US |
| dc.citation.woscount | 0 | |
| dc.contributor.author | LU, NCC | en_US |
| dc.contributor.author | LU, CY | en_US |
| dc.contributor.author | LEE, MK | en_US |
| dc.contributor.author | SHIH, CC | en_US |
| dc.contributor.author | WANG, CS | en_US |
| dc.contributor.author | SHENG, TT | en_US |
| dc.contributor.author | REUTER, W | en_US |
| dc.contributor.department | 交大名義發表 | zh_TW |
| dc.contributor.department | National Chiao Tung University | en_US |
| dc.date.accessioned | 2014-12-08T15:06:25Z | |
| dc.date.available | 2014-12-08T15:06:25Z | |
| dc.date.issued | 1982 | en_US |
| dc.identifier.issn | 0013-4651 | en_US |
| dc.identifier.journal | JOURNAL OF THE ELECTROCHEMICAL SOCIETY | en_US |
| dc.identifier.uri | https://ir.lib.nycu.edu.tw/handle/11536/4986 | |
| dc.identifier.wosnumber | WOS:A1982PA69100286 | |
| dc.language.iso | en_US | en_US |
| dc.title | CHARACTERIZATION OF MONOLITHIC POLYCRYSTALLINE-SILICON RESISTORS IN SUB-MICRON THICKNESS | en_US |
| dc.type | Meeting Abstract | en_US |
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