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國立陽明交通大學機構典藏
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公開日期
標題
作者
1-十月-1995
MICROCRYSTALLINE SIC FILMS GROWN BY ELECTRON-CYCLOTRON-RESONANCE CHEMICAL-VAPOR-DEPOSITION AT LOW-TEMPERATURES
CHENG, KL
;
CHENG, HC
;
LIU, CC
;
LEE, C
;
YEW, TR
;
電子工程學系及電子研究所
;
Department of Electronics Engineering and Institute of Electronics
1-十月-1995
MICROCRYSTALLINE SIC FILMS GROWN BY ELECTRON-CYCLOTRON-RESONANCE CHEMICAL-VAPOR-DEPOSITION AT LOW-TEMPERATURES
CHENG, KL
;
CHENG, HC
;
LIU, CC
;
LEE, C
;
YEW, TR
;
電子工程學系及電子研究所
;
Department of Electronics Engineering and Institute of Electronics
1-五月-1995
A NEW ANALYTICAL EXPRESSION FOR THE INTERFACE INDEX OF METAL SCHOTTKY CONTACTS ON SEMICONDUCTORS
SZE, JJ
;
CHENG, HC
;
電子工程學系及電子研究所
;
Department of Electronics Engineering and Institute of Electronics
1-一月-1995
A NEW FABRICATION TECHNOLOGY FOR FIELD-EMISSION TRIODES WITH EMITTER-GATE SEPARATION OF 0.18-MU-M
WANG, CC
;
LEE, WF
;
KU, TK
;
CHEN, MS
;
FENG, MS
;
HSIEH, IJ
;
CHENG, HC
;
電子工程學系及電子研究所
;
Department of Electronics Engineering and Institute of Electronics
1-一月-1993
A NEW OXIDATION-RESISTANT COSI2 PROCESS FOR SELF-ALIGNED SILICIDATION (SALICIDE) TECHNOLOGY
LOU, YS
;
WU, CY
;
CHENG, HC
;
電子工程學系及電子研究所
;
Department of Electronics Engineering and Institute of Electronics
1-一月-1994
A NEW PORTRAYAL OF OXIDATION OF UNDOPED POLYCRYSTALLINE SILICON FILMS IN A SHORT-DURATION
WANG, PW
;
SU, HP
;
TSAI, MJ
;
HONG, G
;
FENG, MS
;
CHENG, HC
;
奈米中心
;
Nano Facility Center
30-三月-1992
NOVEL ANNEALING SCHEME FOR FABRICATING HIGH-QUALITY TI-SILICIDED SHALLOW N+P JUNCTION BY P+ IMPLANTATION INTO THIN TI FILMS ON SI SUBSTRATE
JUANG, MH
;
CHENG, HC
;
電子工程學系及電子研究所
;
Department of Electronics Engineering and Institute of Electronics
1-七月-1992
NOVEL EFFECTS OF HEATING RATE ON THE ACTIVATION RECRYSTALLIZATION OF BORON-IMPLANTED SI SUBSTRATES
JUANG, MH
;
CHENG, HC
;
電子工程學系及電子研究所
;
Department of Electronics Engineering and Institute of Electronics
15-九月-1993
NOVEL PHENOMENON OF THE AL-1 WT-PERCENT-SI CONTACTS ON THE NF3/AR POST-ETCHING-TREATED N-SI SUBSTRATES
CHENG, HC
;
CHEN, YE
;
JUANG, MH
;
YEN, PW
;
LIN, L
;
奈米中心
;
Nano Facility Center
1-十二月-1994
NOVEL STRUCTURE FOR MEASURING THE DENSITY-OF-STATE DISTRIBUTION OF HIGH-RESISTIVITY SEMICONDUCTOR-FILMS BY ISOTHERMAL CAPACITANCE TRANSIENT SPECTROSCOPY
CHEN, YE
;
WANG, FS
;
TSAI, JW
;
CHENG, HC
;
電子工程學系及電子研究所
;
Department of Electronics Engineering and Institute of Electronics
1-九月-1995
NOVEL TECHNIQUE TO FORM PT-SILICIDED SHALLOW P(+)N JUNCTIONS USING LOW-TEMPERATURE PROCESSES
MA, KP
;
LIN, CT
;
CHENG, HC
;
奈米中心
;
Nano Facility Center
1-九月-1995
NOVEL TECHNIQUE TO FORM PT-SILICIDED SHALLOW P(+)N JUNCTIONS USING LOW-TEMPERATURE PROCESSES
MA, KP
;
LIN, CT
;
CHENG, HC
;
奈米中心
;
Nano Facility Center
1-六月-1995
NOVEL TUNNELING DIELECTRIC PREPARED BY OXIDATION OF ULTRATHIN RUGGED POLYSILICON FOR 5-V-ONLY NONVOLATILE MEMORIES
SU, HP
;
LIU, HW
;
WANG, PW
;
CHENG, PW
;
JEN, IM
;
HONG, G
;
CHENG, HC
;
電子工程學系及電子研究所
;
Department of Electronics Engineering and Institute of Electronics
1-六月-1991
PREPARATION OF FINE-GRAINED BATIO3
FAN, YC
;
CHENG, HC
;
TSENG, TY
;
交大名義發表
;
電控工程研究所
;
National Chiao Tung University
;
Institute of Electrical and Control Engineering
30-八月-1993
THE PROCESS LIMITATION FOR FORMING TI SILICIDED SHALLOW JUNCTION BY BF(2)+ IMPLANTATION INTO THIN POLYCRYSTALLINE SI FILMS AND SUBSEQUENT TI SILICIDATION
JUANG, MH
;
LIN, CT
;
JAN, ST
;
CHENG, HC
;
電控工程研究所
;
Institute of Electrical and Control Engineering
1-八月-1992
THE PROCESS WINDOW OF A-SI/TI BILAYER METALLIZATION FOR AN OXIDATION-RESISTANT AND SELF-ALIGNED TISI2 PROCESS
LOU, YS
;
WU, CY
;
CHENG, HC
;
電子工程學系及電子研究所
;
Department of Electronics Engineering and Institute of Electronics
1-四月-1992
THE REVERSE ANNEAL OF JUNCTION CHARACTERISTICS IN FORMING SHALLOW P+-N JUNCTION BY BF-2(+) IMPLANTATION INTO THIN CO FILMS ON SI SUBSTRATE
JUANG, MH
;
CHENG, HC
;
電子工程學系及電子研究所
;
Department of Electronics Engineering and Institute of Electronics
1-九月-1994
REVERSE ANNEALING OF ARSENIC-IMPLANTED LOW-PRESSURE CHEMICAL-VAPOR-DEPOSITION (LPCVD) AMORPHOUS-SILICON FILMS
TSAI, MJ
;
WANG, FS
;
CHENG, HC
;
電子工程學系及電子研究所
;
Department of Electronics Engineering and Institute of Electronics
15-七月-1994
SHALLOW JUNCTIONS FORMED BY BF2+ IMPLANTATION INTO THIN COSI FILMS AND RAPID THERMAL ANNEALING
JUANG, MH
;
LIN, CT
;
CHENG, HC
;
交大名義發表
;
電子工程學系及電子研究所
;
National Chiao Tung University
;
Department of Electronics Engineering and Institute of Electronics
1-一月-1993
SHALLOW N(+)P JUNCTION FORMATION BY IMPLANTING P+ IONS INTO THIN CO FILMS AND LASER PROCESSING
CHENG, HC
;
JUANG, MH
;
電子工程學系及電子研究所
;
Department of Electronics Engineering and Institute of Electronics