標題: | A NEW ANALYTICAL EXPRESSION FOR THE INTERFACE INDEX OF METAL SCHOTTKY CONTACTS ON SEMICONDUCTORS |
作者: | SZE, JJ CHENG, HC 電子工程學系及電子研究所 Department of Electronics Engineering and Institute of Electronics |
公開日期: | 1-五月-1995 |
摘要: | By reconsidering the effect of the penetration depth of the interface states, a new analytical expression of the interface index has been achieved to successfully explain the role of the semiconductor ionicity in the behavior of metal-Schottky contacts on semiconductors. The derived interface indices not only fit quite well with the previous experimental data but also exhibit a sharp transition from the Bardeen limit to the Schottky limit for semiconductor ionicity around 0.8, which agrees well with the experiment reports. |
URI: | http://dx.doi.org/10.1016/0038-1101(95)98675-S http://hdl.handle.net/11536/1937 |
ISSN: | 0038-1101 |
DOI: | 10.1016/0038-1101(95)98675-S |
期刊: | SOLID-STATE ELECTRONICS |
Volume: | 38 |
Issue: | 5 |
起始頁: | 1059 |
結束頁: | 1063 |
顯示於類別: | 期刊論文 |