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公開日期標題作者
1-八月-1996Enhanced metalorganic chemical vapor deposition titanium nitride film fabricated using tetrakis-dimethylamino-titanium for barrier metal application in sub-half-micron technologyWang, CK; Liu, LM; Liao, M; Cheng, HC; Lin, MS; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1-八月-1996Enhanced metalorganic chemical vapor deposition titanium nitride film fabricated using tetrakis-dimethylamino-titanium for barrier metal application in sub-half-micron technologyWang, CK; Liu, LM; Liao, M; Cheng, HC; Lin, MS; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1-十一月-2008Impacts of N-2 and NH3 Plasma Surface Treatments on High-Performance LTPS-TFT With High-kappa Gate DielectricMa, Ming-Wen; Chao, Tien-Sheng; Chiang, Tsung-Yu; Wu, Woei-Cherng; Lei, Tan-Fu; 電子物理學系; 電子工程學系及電子研究所; Department of Electrophysics; Department of Electronics Engineering and Institute of Electronics
1-七月-2011Improved characteristics for Pd nanocrystal memory with stacked HfAlO-SiO2 tunnel layerKang, Tsung-Kuei; Liu, Han-Wen; Wang, Fang-Hsing; Lin, Cheng-Li; Liao, Ta-Chuan; Wu, Wen-Fa; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1-二月-2016Performance Improvement of Poly-Si Tunnel FETs by Trap Density ReductionCheng-Yu, William; Chen, Yi-Hsuan; 電子物理學系; Department of Electrophysics
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