Browsing by Author Fang, JY

Jump to: 0-9 A B C D E F G H I J K L M N O P Q R S T U V W X Y Z
or enter first few letters:  
Showing results 1 to 8 of 8
Issue DateTitleAuthor(s)
2000Characteristics of optical properties of the interrupt growth method on InGaN/GaN MQW structuresLin, CF; Shu, CK; Lee, WH; Wen, TC; Chu, CF; Fang, JY; Chen, WK; Lee, WI; Wang, SC; 光電工程學系; Department of Photonics
1-Feb-2006Double-corrugated C-shaped aperture for near-field recordingChen, YC; Fang, JY; Tien, CH; Shieh, HPD; 光電工程學系; 顯示科技研究所; Department of Photonics; Institute of Display
2006Effect of surface passivation removal on planarization efficiency in Cu abrasive-free polishingFang, JY; Tsai, MS; Dai, BT; Wu, YS; Feng, MS; 材料科學與工程學系; Department of Materials Science and Engineering
1-Mar-2006High-transmission hybrid-effect-assisted nanoapertureChen, YC; Fang, JY; Tien, CH; Shieh, HPD; 光電工程學系; 顯示科技研究所; Department of Photonics; Institute of Display
14-Feb-2006Orbital susceptibilities of PbSe quantum dotsJian, WB; Lu, WG; Fang, JY; Chiang, SJ; Lan, MD; Wu, CY; Wu, ZY; Chen, FR; Kai, JJ; 電子物理學系; Department of Electrophysics
2005Pattern effect optimized with non-native surface passivation in copper abrasive-free polishingFang, JY; Tsai, MS; Dai, BT; Wu, YS; Feng, MS; 材料科學與工程學系; Department of Materials Science and Engineering
1-Jan-2004Roles of copper mechanical characteristics in electropolishingChang, SC; Shieh, JM; Fang, JY; Wang, YL; Dai, BT; Feng, MS; 材料科學與工程學系; Department of Materials Science and Engineering
2006Study on pressure-independent Cu removal in Cu abrasive-free polishingFang, JY; Huang, PW; Tsai, MS; Dai, BT; Wu, YS; Feng, MS; 材料科學與工程學系; Department of Materials Science and Engineering