國立陽明交通大學機構典藏：瀏覽交通大學機構典藏

瀏覽的方式：作者 Hung, Chi-Cheng

顯示 1 到 7 筆資料，總共 7 筆

公開日期	標題	作者
1-十一月-2016	Cleaning methodology of small residue defect with surfactant in copper chemical mechanical polishing post-cleaning	Wei, Kuo-Hsiu; Hung, Chi-Cheng; Wang, Yu-Sheng; Liu, Chuan-Pu; Chen, Kei-Wei; Wang, Ying-Lang; 照明與能源光電研究所; Institute of Lighting and Energy Photonics
1-十一月-2016	Cleaning methodology of small residue defect with surfactant in copper chemical mechanical polishing post-cleaning	Wei, Kuo-Hsiu; Hung, Chi-Cheng; Wang, Yu-Sheng; Liu, Chuan-Pu; Chen, Kei-Wei; Wang, Ying-Lang; 照明與能源光電研究所; Institute of Lighting and Energy Photonics
1-一月-2008	Effect of bis-(3-sodiumsulfopropyl disulfide) byproducts on copper defects after chemical mechanical polishing	Hung, Chi-Cheng; Lee, Wen-Hsi; Hu, Shao-Yu; Chang, Shih-Chieh; Chen, Kei-Wei; Wang, Ying-Lang; 交大名義發表; National Chiao Tung University
5-三月-2017	Effect of tungsten incorporation in cobalt tungsten alloys as seedless diffusion barrier materials	Su, Yin-Hsien; Kuo, Tai-Chen; Lee, Wen-Hsi; Wang, Yu-Sheng; Hung, Chi-Cheng; Tseng, Wei-Hsiang; Wei, Kuo-Hsiu; Wang, Ying-Lang; 照明與能源光電研究所; Institute of Lighting and Energy Photonics
1-七月-2010	Effect of Under-Layer Treatment of Ta/TaN Barrier Film on Corrosion Between Cu Seed and Ta in Chemical-Mechanical-Polishing Slurry	Lee, Wen-Hsi; Hung, Chi-Cheng; Wang, Yu-Sheng; Chang, Shih-Chieh; Wang, Ying-Lang; 照明與能源光電研究所; Institute of Lighting and Energy Photonics
1-一月-2016	A Study on the Plating and Wetting Ability of Ruthenium-Tungsten Multi-layers for Advanced Cu Metallization	Kuo, Tai-Chen; Su, Yin-Hsien; Lee, Wen-Hsi; Liao, Wei-Hsiang; Wang, Yu-Sheng; Hung, Chi-Cheng; Wang, Ying-Lang; 照明與能源光電研究所; Institute of Lighting and Energy Photonics
16-八月-2016	A study on the plating and wetting ability of ruthenium-tungsten multi-layers for advanced Cu metallization	Kuo, Tai-Chen; Su, Yin-Hsien; Lee, Wen-Hsi; Liao, Wei-Hsiang; Wang, Yu-Sheng; Hung, Chi-Cheng; Wang, Ying-Lang; 光電工程學系; Department of Photonics

顯示 1 到 7 筆資料，總共 7 筆