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國立陽明交通大學機構典藏
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公開日期
標題
作者
15-十一月-2004
Behavior and surface energies of polybenzoxazines formed by polymerization with argon, oxygen, and hydrogen plasmas
Chen, JK
;
Lin, IK
;
Ko, FH
;
Huang, CF
;
Chen, KS
;
Chan, CH
;
Chang, FC
;
應用化學系
;
Department of Applied Chemistry
1999
Characterization and lithographic parameters extraction for the modified resists
Ko, FH
;
Lu, JK
;
Chu, TC
;
Huang, TY
;
Yang, CC
;
Sheu, JT
;
Huang, HL
;
奈米中心
;
Nano Facility Center
2000
Characterization and modeling of out-diffusion of cesium, manganese and zinc impurities from deep ultraviolet photoresist
Ko, FH
;
Wang, MY
;
Wang, TK
;
Yang, CC
;
Huang, TY
;
Wu, CS
;
奈米中心
;
Nano Facility Center
1-九月-1999
Characterization and modeling of out-diffusion of manganese and zinc impurities from deep ultraviolet photoresist
Wang, MY
;
Ko, FH
;
Wang, TK
;
Yang, CC
;
Huang, TY
;
奈米中心
;
Nano Facility Center
1-五月-2001
Characterization and modeling of the metal diffusion from deep ultraviolet photoresist and silicon-based substrate
Wang, TK
;
Wang, MY
;
Ko, FH
;
Tseng, CL
;
奈米中心
;
Nano Facility Center
1-四月-2006
Characterization of imprinting polymeric temperature variation with fluorescent Rhodamine B molecule
Ko, FH
;
Weng, LY
;
Ko, CJ
;
Chu, TC
;
材料科學與工程學系奈米科技碩博班
;
Graduate Program of Nanotechnology , Department of Materials Science and Engineering
1-十一月-2001
Comparison of novel cleaning solutions, with various chelating agents for post-CMP cleaning on poly-Si film
Pan, TM
;
Lei, TF
;
Ko, FH
;
Chao, TS
;
Chiu, TH
;
Lee, YH
;
Lu, CP
;
電子工程學系及電子研究所
;
Department of Electronics Engineering and Institute of Electronics
8-四月-2005
Direct quantitative analysis of phthalate esters as micro-contaminants in cleanroom air and wafer surfaces by auto-thermal desorption-gas chromatography-mass spectrometry
Kang, YH
;
Den, W
;
Bai, HL
;
Ko, FH
;
環境工程研究所
;
Institute of Environmental Engineering
1-十一月-2004
Effect of fluoroalkyl substituents on the reactions of alkylchlorosilanes with mold surfaces for nanoimprint lithography
Chen, JK
;
Ko, FH
;
Hsieh, KF
;
Chou, CT
;
Chang, FC
;
材料科學與工程學系奈米科技碩博班
;
應用化學系
;
奈米中心
;
Graduate Program of Nanotechnology , Department of Materials Science and Engineering
;
Department of Applied Chemistry
;
Nano Facility Center
2005
Effects of metallic contaminants on the electrical characteristics of ultrathin gate oxides
Pan, TM
;
Ko, FH
;
Chao, TS
;
Chen, CC
;
Chang-Liao, KS
;
材料科學與工程學系奈米科技碩博班
;
電子物理學系
;
Graduate Program of Nanotechnology , Department of Materials Science and Engineering
;
Department of Electrophysics
29-二月-2000
Evaluation of cleaning efficiency with a radioactive tracer and development of a microwave digestion method for semiconductor processes
Lu, JK
;
Ko, FH
;
Chu, TC
;
Sun, YC
;
Wang, MY
;
Wang, TK
;
奈米中心
;
Nano Facility Center
1999
Evaluation of impurity migration and microwave digestion methods for lithographic materials
Ko, FH
;
Hsiao, LT
;
Chou, CT
;
Wang, MY
;
Wang, TK
;
Sun, YC
;
Cheng, BJ
;
Yeng, S
;
Dai, BT
;
奈米中心
;
Nano Facility Center
1-十二月-1999
Evaluation of metal migration and determination of trace metals after microwave digestion for lithographic materials
Ko, FH
;
Wang, MY
;
Wang, TK
;
奈米中心
;
Nano Facility Center
1-四月-2006
Fabricating and characterizing oblique polymer structures by electron beam writing on resist-coated SiO2 wafers
Ko, FH
;
Chen, JK
;
Chang, FC
;
材料科學與工程學系奈米科技碩博班
;
應用化學系
;
Graduate Program of Nanotechnology , Department of Materials Science and Engineering
;
Department of Applied Chemistry
3-三月-2006
Fabrication of biomimetic super-amphiphobic surfaces through plasma modification of benzoxazine films
Wang, CF
;
Chiou, SF
;
Ko, FH
;
Chou, CT
;
Lin, HC
;
Huang, CF
;
Chang, FC
;
材料科學與工程學系奈米科技碩博班
;
應用化學系
;
Graduate Program of Nanotechnology , Department of Materials Science and Engineering
;
Department of Applied Chemistry
1-六月-2004
Fabrication of sub-60-nm contact holes in silicon dioxide layers
Ko, FH
;
You, HC
;
Chu, TC
;
Lei, TF
;
Hsu, CC
;
Chen, HL
;
電子工程學系及電子研究所
;
Department of Electronics Engineering and Institute of Electronics
2000
Film characterization and evaluation of process performance for the modified electron beam resist
Ko, FH
;
Ting, JH
;
Chou, CT
;
Hsiao, LT
;
Huang, TY
;
Dai, BT
;
奈米中心
;
Nano Facility Center
3-四月-2006
Fullerene-incorporation for enhancing the electron beam resist performance for contact hole patterning and filling
You, HC
;
Ko, FH
;
Lei, TF
;
材料科學與工程學系奈米科技碩博班
;
電子工程學系及電子研究所
;
Graduate Program of Nanotechnology , Department of Materials Science and Engineering
;
Department of Electronics Engineering and Institute of Electronics
1-六月-2003
Mechanism and modeling of ring pattern formation for electron beam exposure on Zwitterresist
Chen, JK
;
Ko, FH
;
Chen, HL
;
Chang, FC
;
應用化學系
;
Department of Applied Chemistry
1-十月-2000
Migration-adsorption mechanism of metallic impurities out of chemically amplified photoresist onto silicon-based substrates
Yang, CC
;
Ko, FH
;
Wang, MY
;
Wang, TK
;
Wu, SC
;
奈米中心
;
Nano Facility Center