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公開日期標題作者
15-十一月-2004Behavior and surface energies of polybenzoxazines formed by polymerization with argon, oxygen, and hydrogen plasmasChen, JK; Lin, IK; Ko, FH; Huang, CF; Chen, KS; Chan, CH; Chang, FC; 應用化學系; Department of Applied Chemistry
1999Characterization and lithographic parameters extraction for the modified resistsKo, FH; Lu, JK; Chu, TC; Huang, TY; Yang, CC; Sheu, JT; Huang, HL; 奈米中心; Nano Facility Center
2000Characterization and modeling of out-diffusion of cesium, manganese and zinc impurities from deep ultraviolet photoresistKo, FH; Wang, MY; Wang, TK; Yang, CC; Huang, TY; Wu, CS; 奈米中心; Nano Facility Center
1-九月-1999Characterization and modeling of out-diffusion of manganese and zinc impurities from deep ultraviolet photoresistWang, MY; Ko, FH; Wang, TK; Yang, CC; Huang, TY; 奈米中心; Nano Facility Center
1-五月-2001Characterization and modeling of the metal diffusion from deep ultraviolet photoresist and silicon-based substrateWang, TK; Wang, MY; Ko, FH; Tseng, CL; 奈米中心; Nano Facility Center
1-四月-2006Characterization of imprinting polymeric temperature variation with fluorescent Rhodamine B moleculeKo, FH; Weng, LY; Ko, CJ; Chu, TC; 材料科學與工程學系奈米科技碩博班; Graduate Program of Nanotechnology , Department of Materials Science and Engineering
1-十一月-2001Comparison of novel cleaning solutions, with various chelating agents for post-CMP cleaning on poly-Si filmPan, TM; Lei, TF; Ko, FH; Chao, TS; Chiu, TH; Lee, YH; Lu, CP; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
8-四月-2005Direct quantitative analysis of phthalate esters as micro-contaminants in cleanroom air and wafer surfaces by auto-thermal desorption-gas chromatography-mass spectrometryKang, YH; Den, W; Bai, HL; Ko, FH; 環境工程研究所; Institute of Environmental Engineering
1-十一月-2004Effect of fluoroalkyl substituents on the reactions of alkylchlorosilanes with mold surfaces for nanoimprint lithographyChen, JK; Ko, FH; Hsieh, KF; Chou, CT; Chang, FC; 材料科學與工程學系奈米科技碩博班; 應用化學系; 奈米中心; Graduate Program of Nanotechnology , Department of Materials Science and Engineering; Department of Applied Chemistry; Nano Facility Center
2005Effects of metallic contaminants on the electrical characteristics of ultrathin gate oxidesPan, TM; Ko, FH; Chao, TS; Chen, CC; Chang-Liao, KS; 材料科學與工程學系奈米科技碩博班; 電子物理學系; Graduate Program of Nanotechnology , Department of Materials Science and Engineering; Department of Electrophysics
29-二月-2000Evaluation of cleaning efficiency with a radioactive tracer and development of a microwave digestion method for semiconductor processesLu, JK; Ko, FH; Chu, TC; Sun, YC; Wang, MY; Wang, TK; 奈米中心; Nano Facility Center
1999Evaluation of impurity migration and microwave digestion methods for lithographic materialsKo, FH; Hsiao, LT; Chou, CT; Wang, MY; Wang, TK; Sun, YC; Cheng, BJ; Yeng, S; Dai, BT; 奈米中心; Nano Facility Center
1-十二月-1999Evaluation of metal migration and determination of trace metals after microwave digestion for lithographic materialsKo, FH; Wang, MY; Wang, TK; 奈米中心; Nano Facility Center
1-四月-2006Fabricating and characterizing oblique polymer structures by electron beam writing on resist-coated SiO2 wafersKo, FH; Chen, JK; Chang, FC; 材料科學與工程學系奈米科技碩博班; 應用化學系; Graduate Program of Nanotechnology , Department of Materials Science and Engineering; Department of Applied Chemistry
3-三月-2006Fabrication of biomimetic super-amphiphobic surfaces through plasma modification of benzoxazine filmsWang, CF; Chiou, SF; Ko, FH; Chou, CT; Lin, HC; Huang, CF; Chang, FC; 材料科學與工程學系奈米科技碩博班; 應用化學系; Graduate Program of Nanotechnology , Department of Materials Science and Engineering; Department of Applied Chemistry
1-六月-2004Fabrication of sub-60-nm contact holes in silicon dioxide layersKo, FH; You, HC; Chu, TC; Lei, TF; Hsu, CC; Chen, HL; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
2000Film characterization and evaluation of process performance for the modified electron beam resistKo, FH; Ting, JH; Chou, CT; Hsiao, LT; Huang, TY; Dai, BT; 奈米中心; Nano Facility Center
3-四月-2006Fullerene-incorporation for enhancing the electron beam resist performance for contact hole patterning and fillingYou, HC; Ko, FH; Lei, TF; 材料科學與工程學系奈米科技碩博班; 電子工程學系及電子研究所; Graduate Program of Nanotechnology , Department of Materials Science and Engineering; Department of Electronics Engineering and Institute of Electronics
1-六月-2003Mechanism and modeling of ring pattern formation for electron beam exposure on ZwitterresistChen, JK; Ko, FH; Chen, HL; Chang, FC; 應用化學系; Department of Applied Chemistry
1-十月-2000Migration-adsorption mechanism of metallic impurities out of chemically amplified photoresist onto silicon-based substratesYang, CC; Ko, FH; Wang, MY; Wang, TK; Wu, SC; 奈米中心; Nano Facility Center
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