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公開日期標題作者
15-十一月-2003The application of electrochemical metrologies for investigating chemical mechanical polishing of Al with a Ti barrier layerChiu, SY; Wang, YL; Liu, CP; Lan, JK; Ay, C; Feng, MS; Tsai, MS; Dai, BT; 材料科學與工程學系; Department of Materials Science and Engineering
1-十一月-2001Characterization and reliability of low dielectric constant fluorosilicate glass and silicon rich oxide process for deep sub-micron device applicationCheng, YL; Wang, YL; Liu, CW; Wu, YL; Lo, KY; Liu, CP; Lan, JK; 材料科學與工程學系; Department of Materials Science and Engineering
1-三月-2006Characterization and thermal stability of fluorosilicate glass films deposited by high density plasma chemical vapor deposition with different bias powerHsiao, WC; Liu, CP; Wang, YL; Cheng, YL; 材料科學與工程學系; Department of Materials Science and Engineering
1-九月-2004Direct COSi2 thin-film formation with homogeneous nanograin-size distribution by oxide-mediated silicidationChang, JJ; Liu, CP; Chen, SW; Chang, CC; Hsieh, TE; Wang, YL; 材料科學與工程學系; Department of Materials Science and Engineering
1-五月-2004Effect of deposition temperature, on thermal stability in high-density plasma chemical vapor deposition fluorine-doped silicon dioxideCheng, YL; Wang, YL; Chen, HW; Lan, JL; Liu, CP; Wu, SA; Wu, YL; Lo, KY; Feng, MS; 材料科學與工程學系; Department of Materials Science and Engineering
30-一月-2004Evaluation of advanced chemical mechanical planarization techniques for copper damascene interconnectChen, KW; Wang, YL; Liu, CP; Yang, K; Chang, L; Lo, KY; Liu, CW; 材料科學與工程學系; Department of Materials Science and Engineering
1-四月-2005Formation of pyramid-like nanostructures during cobalt film growth by magnetron sputteringLiu, CP; Chang, JJ; Chen, SW; Chung, HC; Wang, YL; 材料科學與工程學系; Department of Materials Science and Engineering
1-三月-2006High-selectivity damascene chemical mechanical polishingChiu, SY; Wang, YL; Liu, CP; Chang, SC; Hwang, GJ; Feng, MS; Chen, CF; 材料科學與工程學系; Department of Materials Science and Engineering
15-一月-2004Integration of a stack of two fluorine doped silicon oxide film with ULSI interconnect metallizationCheng, YL; Wang, YL; Liu, CP; Wu, YL; Lo, KY; Liu, CW; Lan, JK; Ay, C; Feng, MS; 材料科學與工程學系; Department of Materials Science and Engineering
1-十一月-2001Integration of MOCVD titanium nitride with collimated titanium and ion metal plasma titanium for 0.18-mu m logic processLan, JK; Wang, YL; Lo, KY; Liu, CP; Liu, CW; Wang, JK; Cheng, YL; Chau, CG; 材料科學與工程學系; Department of Materials Science and Engineering
1-九月-2003Mechanisms of circular defects for shallow trench isolation oxide depositionLan, JK; Wang, YL; Liu, CP; Chao, CG; Ay, CY; Liu, CW; Cheng, YL; 材料科學與工程學系; Department of Materials Science and Engineering
24-一月-2005Modified polycrystalline silicon chemical-vapor deposition process for improving roughness at oxide/polycrystalline silicon interfaceChang, JJ; Hsieh, TE; Wang, YL; Tseng, WT; Liu, CP; Lan, CY; 材料科學與工程學系; Department of Materials Science and Engineering
30-一月-2004Moisture resistance and thermal stability of fluorine-incorporation siloxane-based low-dielectric-constant materialCheng, YL; Wang, YL; Wu, YL; Liu, CP; Liu, CW; Lan, JK; O'Neil, ML; Ay, C; Feng, MS; 材料科學與工程學系; Department of Materials Science and Engineering
30-一月-2004Monitor and eliminate the circular defects in HDP-STI deposition through oxynitride/oxide composite linerLan, JK; Wang, YL; Liu, CP; Lee, WH; Ay, C; Cheng, YL; Chang, SC; 材料科學與工程學系; Department of Materials Science and Engineering
1-三月-2006Novel slurry solution for dishing elimination in copper process beyond 0.1-mu m technologyChen, KW; Wang, YL; Liu, CP; Chang, L; Li, FY; 材料科學與工程學系; Department of Materials Science and Engineering
24-二月-2006The study of diffusion and nucleation for COSi2 formation by oxide-mediated cobalt silicidationChang, JJ; Liu, CP; Hsieh, TE; Wang, YL; 材料科學與工程學系; Department of Materials Science and Engineering
1-九月-2005Study of diffusion and quality control for CoSi2 formation by oxide-mediated cobalt silicidation with Ti cappingChang, JJ; Liu, CP; Hsieh, TE; Wang, YL; 材料科學與工程學系; Department of Materials Science and Engineering
30-一月-2004Study on precipitations of fluorine-doped silicon oxideWu, J; Wang, YL; Liu, CP; Chang, SC; Kuo, CT; Ay, C; 材料科學與工程學系; Department of Materials Science and Engineering
22-三月-2005Two-color resonant four-wave mixing spectroscopy of highly predissociated levels in the (A)over-tilde(2)A(1) state of CH3SLiu, CP; Reid, SA; Lee, YP; 應用化學系; Department of Applied Chemistry
1-三月-2006Uniform COSi2 nano-nucleus formation by oxide mediated silicidation with a Ti capping layerChang, JJ; Hsieh, TE; Liu, CP; Wang, YL; 材料科學與工程學系; Department of Materials Science and Engineering
顯示 1 到 20 筆資料，總共 20 筆