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顯示 1 到 18 筆資料，總共 18 筆
公開日期標題作者
1996Anomalous selective tungsten growth by chemical vapor depositionMei, YJ; Chang, TC; Sheu, JD; Yeh, WK; Pan, FM; Chang, CY; 交大名義發表; 電子工程學系及電子研究所; National Chiao Tung University; Department of Electronics Engineering and Institute of Electronics
31-十月-1997Characterization of TiN film grown by low-pressure-chemical-vapor-depositionMei, YJ; Chang, TC; Hu, JC; Chen, LJ; Yang, YL; Pan, FM; Wu, WF; Ting, A; Chang, CY; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1-二月-1996Disordered Si/SiGe superlattices grown by ultrahigh vacuum chemical vapor depositionChang, TC; Yeh, WK; Chang, CY; Jung, TG; Tsai, WC; Huang, GW; Mei, YJ; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1-十一月-2001The effect of ammonia plasma treatment on low-k methyl-hybrido-silsesquioxane against photoresist stripping damageChang, TC; Mor, YS; Liu, PT; Tsai, TM; Chen, CW; Mei, YJ; Sze, SM; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1-十二月-2001Effectiveness of NH3 plasma treatment in preventing wet stripper damage to low-k hydrogen silsesquioxane (HSQ)Chang, TC; Mor, YS; Liu, PT; Tsai, TM; Chen, CW; Mei, YJ; Sze, SM; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1-九月-1999Effects of H-2 plasma treatment on low dielectric constant methylsilsesquioxaneChang, TC; Liu, PT; Mei, YJ; Mor, YS; Perng, TH; Yang, YL; Sze, SM; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1-七月-2002Eliminating dielectric degradation of low-k organosilicate glass by trimethylchlorosilane treatmentChang, TC; Liu, PT; Mor, YS; Tsai, TM; Chen, CW; Mei, YJ; Pan, FM; Wu, WF; Sze, SM; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1-十一月-2001Enhancing the resistance of low-k hydrogen silsesquioxane (HSQ) to wet stripper damageChang, TC; Mor, YS; Liu, PT; Tsai, TM; Chen, CW; Mei, YJ; Sze, SM; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1-十一月-2001Improvement of low dielectric constant methylsilsesquioxane by boron implantation treatmentChang, TC; Mor, YS; Liu, PT; Tsai, TM; Chen, CW; Sze, SM; Mei, YJ; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1-二月-1996Light emission from the porous boron delta-doped Si superlatticeChang, TC; Yeh, WK; Hsu, MY; Chang, CY; Lee, CP; Jung, TG; Tsai, WC; Huang, GW; Mei, YJ; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
2-十二月-2002The novel pattern method of low-k hybrid-organic-siloxane-polymer film using X-ray exposureChang, TC; Tsai, TM; Liu, PT; Mor, YS; Chen, CW; Mei, YJ; Sheu, JT; Tseng, TY; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1-十月-1996Photoluminescence from ordered and disordered Si-SiGe superlatticesChang, TC; Yeh, WK; Mei, YJ; Tsai, WC; Chen, YF; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1-十月-1996Photoluminescence from ordered and disordered Si-SiGe superlatticesChang, TC; Yeh, WK; Mei, YJ; Tsai, WC; Chen, YF; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1-四月-2002Preventing dielectric damage of low-k organic siloxane by passivation treatmentChang, TC; Mor, YS; Liu, PT; Tsai, TM; Chen, CW; Mei, YJ; Pan, FM; Wu, WF; Sze, SM; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1-八月-2002Recovering dielectric loss of low dielectric constant organic siloxane during the photoresist removal processChang, TC; Mor, YS; Liu, PT; Tsai, TM; Chen, CW; Mei, YJ; Sze, SM; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
31-十月-1997Stabilizing dielectric constant of fluorine-doped SiO2 film by N2O and NH3 plasma post-treatmentMei, YJ; Chang, TC; Chang, SJ; Pan, FM; Chen, MSK; Tuan, A; Chou, S; Chang, CY; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1996Thermal stability and interaction between SiOF and Cu filmMei, YJ; Chang, TC; Sheu, JD; Yeh, WK; Pan, FM; Chang, CY; 交大名義發表; 電子工程學系及電子研究所; National Chiao Tung University; Department of Electronics Engineering and Institute of Electronics
1-四月-1996Uniformity of epilayer grown by ultrahigh-vacuum chemical vapor depositionChang, TC; Yeh, WK; Chang, CY; Jung, TG; Tsai, WC; Huang, GW; Mei, YJ; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
顯示 1 到 18 筆資料，總共 18 筆