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公開日期標題作者
2004An alternative process for silicon nanowire fabrication with SPL and wet etching systemChang, KM; You, KS; Lin, JH; Sheu, JT; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1999Characterization and lithographic parameters extraction for the modified resistsKo, FH; Lu, JK; Chu, TC; Huang, TY; Yang, CC; Sheu, JT; Huang, HL; 奈米中心; Nano Facility Center
1-五月-2003Direct Patterning of low-k hydrogen silsesquioxane using X-ray exposure technologyChang, TC; Tsai, TM; Liu, PT; Mor, YS; Chen, CW; Sheu, JT; Tsengb, TY; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1-七月-2003Direct Patterning of low-k hydrogen silsesquioxane using X-ray exposure technology (vol 6, pg G69, 2003)Chang, TC; Tsai, TM; Liu, PT; Mor, YS; Chen, CW; Sheu, JT; Tseng, TY; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1-四月-2006Fabrication and electrical characterization of nanoscaled-Schottky diodes based on metal silicide/silicon nanowires with scanning probe lithography and wet etchingSheu, JT; Yeh, SP; Lien, CH; Tsai, ST; 材料科學與工程學系奈米科技碩博班; Graduate Program of Nanotechnology , Department of Materials Science and Engineering
1-二月-1998Fabrication of intermediate mask for deep x-ray lithographySheu, JT; Chiang, MH; Su, S; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1-十一月-2004Nanoflash device with self-aligned double floating gates using scanning probe lithography and tetramethylammonium hydroxide wet etchingSheu, JT; Chen, CC; You, KS; Tsai, ST; 材料科學與工程學系奈米科技碩博班; Graduate Program of Nanotechnology , Department of Materials Science and Engineering
1-六月-2004A new fabrication technique for silicon nanowiresSheu, JT; Kuo, JM; You, KS; Chen, CC; Chang, KM; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
2-十二月-2002The novel pattern method of low-k hybrid-organic-siloxane-polymer film using X-ray exposureChang, TC; Tsai, TM; Liu, PT; Mor, YS; Chen, CW; Mei, YJ; Sheu, JT; Tseng, TY; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1-四月-2005Selective deposition of gold nanoparticles on SiO(2)/Si nanowires for molecule detectionSheu, JT; Chen, CC; Huang, PC; Lee, YK; Hsu, ML; 材料科學與工程學系奈米科技碩博班; 應用化學系; Graduate Program of Nanotechnology , Department of Materials Science and Engineering; Department of Applied Chemistry
1-三月-2005Selective deposition of gold nanoparticles on SiO2/Si nanowireSheu, JT; Chen, CC; Huang, PC; Hsu, ML; 材料科學與工程學系奈米科技碩博班; Graduate Program of Nanotechnology , Department of Materials Science and Engineering
1-四月-2006Selective deposition of gold particles on dip-pen nanolithography patterns on silicon dioxide surfacesSheu, JT; Wu, CH; Chao, TS; 材料科學與工程學系奈米科技碩博班; 電子物理學系; Graduate Program of Nanotechnology , Department of Materials Science and Engineering; Department of Electrophysics
1-一月-2004Selective growth of carbon nanotube on scanning probe tips by microwave plasma chemical vapor depositionPan, FM; Liu, YB; Chang, Y; Chen, CY; Tsai, TG; Chang, MN; Sheu, JT; 材料科學與工程學系; Department of Materials Science and Engineering
2001Single-crystal silicon nanostructure fabrication by scanning probe lithography and anisotropic wet etchingChang, KM; You, KS; Wu, CH; Sheu, JT; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1-十一月-2002Single-electron transistor structures based on silicon-on-insulator silicon nanowire fabrication by scanning probe lithography and wet etchingSheu, JT; You, KS; Wu, CH; Chang, KM; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics