國立陽明交通大學機構典藏：瀏覽交通大學機構典藏

瀏覽的方式：作者 Tsai, KC

顯示 1 到 9 筆資料，總共 9 筆

公開日期	標題	作者
1-五月-2004	Alkylation of nanoporous silica thin films by high density plasma chemical vapor deposition of a-SIC : H	Pan, FM; Wu, BW; Cho, AT; Tsai, KC; Tsai, TG; Chao, KJ; Chen, JY; Chang, L; 材料科學與工程學系; Department of Materials Science and Engineering
1-九月-2002	Axial load behavior of stiffened concrete-filled steel columns	Huang, CS; Yeh, YK; Liu, GY; Hu, HT; Tsai, KC; Weng, YT; Wang, SH; Wu, MH; 土木工程學系; Department of Civil Engineering
1-五月-2001	Characteristics of fluorinated amorphous carbon films and implementation of 0.15 mu m Cu/a-C : F damascene interconnection	Shieh, JM; Suen, SC; Tsai, KC; Dai, BT; Wu, YC; Wu, YH; 材料科學與工程學系; Department of Materials Science and Engineering
2006	High-reliability Ta2O5 metal-insulator-metal capacitors with Cu-based electrodes	Tsai, KC; Wu, WF; Chao, CG; Kuan, CP; 材料科學與工程學系; Department of Materials Science and Engineering
1-五月-2004	Influence of N2O plasma treatment on microstructure and thermal stability of WNx barriers for Cu interconnection	Tsai, KC; Wu, WF; Chen, JC; Pan, TJ; Chao, CG; 材料科學與工程學系; Department of Materials Science and Engineering
1-一月-2005	MR-FQ: A fair scheduling algorithm for wireless networks with variable transmission rates	Wang, YC; Tseng, YC; Chen, WT; Tsai, KC; 資訊工程學系; Department of Computer Science
1-八月-2005	Novel multilayered Ti/TiN diffusion barrier for Al metallization	Wu, WF; Tsai, KC; Chao, CG; Chen, JC; Ou, KL; 材料科學與工程學系; Department of Materials Science and Engineering
2005	Numerical and experimental analysis of Cu diffusion in plasma-treated tungsten barrier	Tsai, KC; Wu, WF; Chen, JC; Pan, TJ; Chao, CG; 材料科學與工程學系; Department of Materials Science and Engineering
1-七月-2002	Reduction of etching plasma damage on low dielectric constant fluorinated amorphous carbon films by multiple H-2 plasma treatment	Shieh, JM; Tsai, KC; Dai, BT; Wu, YC; Wu, YH; 材料科學與工程學系; Department of Materials Science and Engineering

顯示 1 到 9 筆資料，總共 9 筆