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顯示 1 到 11 筆資料，總共 11 筆
公開日期標題作者
1-十一月-2016Cleaning methodology of small residue defect with surfactant in copper chemical mechanical polishing post-cleaningWei, Kuo-Hsiu; Hung, Chi-Cheng; Wang, Yu-Sheng; Liu, Chuan-Pu; Chen, Kei-Wei; Wang, Ying-Lang; 照明與能源光電研究所; Institute of Lighting and Energy Photonics
1-十一月-2016Cleaning methodology of small residue defect with surfactant in copper chemical mechanical polishing post-cleaningWei, Kuo-Hsiu; Hung, Chi-Cheng; Wang, Yu-Sheng; Liu, Chuan-Pu; Chen, Kei-Wei; Wang, Ying-Lang; 照明與能源光電研究所; Institute of Lighting and Energy Photonics
5-三月-2017Effect of tungsten incorporation in cobalt tungsten alloys as seedless diffusion barrier materialsSu, Yin-Hsien; Kuo, Tai-Chen; Lee, Wen-Hsi; Wang, Yu-Sheng; Hung, Chi-Cheng; Tseng, Wei-Hsiang; Wei, Kuo-Hsiu; Wang, Ying-Lang; 照明與能源光電研究所; Institute of Lighting and Energy Photonics
1-七月-2010Effect of Under-Layer Treatment of Ta/TaN Barrier Film on Corrosion Between Cu Seed and Ta in Chemical-Mechanical-Polishing SlurryLee, Wen-Hsi; Hung, Chi-Cheng; Wang, Yu-Sheng; Chang, Shih-Chieh; Wang, Ying-Lang; 照明與能源光電研究所; Institute of Lighting and Energy Photonics
1-二月-2013Effects of (002) beta-Ta barrier on copper chemical mechanical polishing behaviorWang, Yu-Sheng; Chen, Kei-Wei; Cheng, Min-Yuan; Lee, Wen-Hsi; Wang, Ying-Lang; 材料科學與工程學系; 光電學院; Department of Materials Science and Engineering; College of Photonics
1-十月-2013An electroplating method for copper plane twin boundary manufacturingWang, Yu-Sheng; Lee, Wen-Hsi; Chang, Shih-Chieh; Nian, Jun-Nan; Wang, Ying-Lang; 照明與能源光電研究所; Institute of Lighting and Energy Photonics
27-四月-2014Evaluating the sensitizing effect on the photocatalytic decoloration of dyes using anatase-TiO2Hsiao, Yu-Cheng; Wu, Tsai-Fang; Wang, Yu-Sheng; Hu, Chi-Chang; Huang, Chihpin; 環境工程研究所; Institute of Environmental Engineering
1-九月-2013The influence of abrasive particle size in copper chemical mechanical planarizationWei, Kuo-Hsiu; Wang, Yu-Sheng; Liu, Chuan-Pu; Chen, Kei-Wei; Wang, Ying-Lang; Cheng, Yi-Lung; 光電學院; College of Photonics
1-三月-2012A Study of Trimethylsilane (3MS) and Tetramethylsilane (4MS) Based alpha-SiCN:H/alpha-SiCO:H Diffusion Barrier FilmsChen, Sheng-Wen; Wang, Yu-Sheng; Hu, Shao-Yu; Lee, Wen-Hsi; Chi, Chieh-Cheng; Wang, Ying-Lang; 照明與能源光電研究所; Institute of Lighting and Energy Photonics
1-一月-2016A Study on the Plating and Wetting Ability of Ruthenium-Tungsten Multi-layers for Advanced Cu MetallizationKuo, Tai-Chen; Su, Yin-Hsien; Lee, Wen-Hsi; Liao, Wei-Hsiang; Wang, Yu-Sheng; Hung, Chi-Cheng; Wang, Ying-Lang; 照明與能源光電研究所; Institute of Lighting and Energy Photonics
16-八月-2016A study on the plating and wetting ability of ruthenium-tungsten multi-layers for advanced Cu metallizationKuo, Tai-Chen; Su, Yin-Hsien; Lee, Wen-Hsi; Liao, Wei-Hsiang; Wang, Yu-Sheng; Hung, Chi-Cheng; Wang, Ying-Lang; 光電工程學系; Department of Photonics
顯示 1 到 11 筆資料，總共 11 筆