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收集所有交通大學研究人員與學生個人或團體所發表之各項學術著作，涵蓋期刊論文、教師專書、學位論文等項。;;Collections of Publications of NCTU Researchers and Students Like Journal Papers and Thesis.

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2 search.filters.author.CHAO, YF

2 search.filters.author.LEE, WC

2 search.filters.author.LIN, SC

2 search.filters.author.WEI, CS

1 search.filters.author.CHAO, TS

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search.filters.subject.THIN FILM

2 search.filters.subject.ELLIPSOMETRY

1 search.filters.subject.CHEMICAL VAPOR DEPOSITION

1 search.filters.subject.POLARIMETRY

1 search.filters.subject.REFRACTIVE INDEX

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🏛️國立陽明交通大學機構典藏

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THE ELLIPSOMETRIC MEASUREMENTS ON SIO2 BY INTENSITY RATIO TECHNIQUE
(1994)
CHAO, YF
;
WEI, CS
;
LEE, WC
;
LIN, SC
;
交大名義發表
DIFLUOROSILYLENE AS A PRECURSOR FOR THE CHEMICAL VAPOR-DEPOSITION OF TITANIUM SILICIDE
(1992-09-01)
CHEN, CC
;
YU, JL
;
LEE, CY
;
LIU, CS
;
CHIU, HT
A new method for preparing thin films of titanium silicide, TiSi2, by chemical vapour deposition of difluorosilylene and titanium tetrachloride is reported.
ELLIPSOMETRIC MEASUREMENTS AND ITS ALIGNMENT - USING THE INTENSITY RATIO TECHNIQUE
(1995-09-01)
CHAO, YF
;
WEI, CS
;
LEE, WC
;
LIN, SC
;
CHAO, TS
Using first-order treatment on azimuth errors of the polarizer (P) and analyzer (A) with respect to the plane of incidence (POI), we construct two intensity ratios around a certain configuration: such as P = +/- pi/4 and A = 0 as compared to A = pi/2. These expressions can be used not only to align the azimuths of the polarizer and analyzer to the POI, hut also to obtain the ellipsometric parameter phi without locating the minimum intensity, BK7 glass and SiO2/Si thin film are ultilized to evaluate this technique.

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