金屬線及空氣低介電常數介電質前瞻性積體技術開發(I)

Full metadata record

DC Field	Value	Language
dc.contributor.author	張國明	en_US
dc.contributor.author	CHANG KOW-MING	en_US
dc.date.accessioned	2014-12-13T10:45:25Z	-
dc.date.available	2014-12-13T10:45:25Z	-
dc.date.issued	2000	en_US
dc.identifier.govdoc	NSC89-2215-E009-090	zh_TW
dc.identifier.uri	http://hdl.handle.net/11536/100350	-
dc.identifier.uri	https://www.grb.gov.tw/search/planDetail?id=583838&docId=109693	en_US
dc.description.sponsorship	行政院國家科學委員會	zh_TW
dc.language.iso	zh_TW	en_US
dc.title	金屬線及空氣低介電常數介電質前瞻性積體技術開發(I)	zh_TW
dc.title	Advanced Integration Techonology of Intermetal and Air Gap Low k Dielectrics for ULSI Application(I)	en_US
dc.type	Plan	en_US
dc.contributor.department	國立交通大學電子工程學系	zh_TW
Appears in Collections:	Research Plans