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dc.contributor.authorLin, Da-Wenen_US
dc.contributor.authorCheng, Ming-Lungen_US
dc.contributor.authorWang, Shyh-Weien_US
dc.contributor.authorWu, Chung-Chengen_US
dc.contributor.authorChen, Ming-Jeren_US
dc.date.accessioned2014-12-08T15:13:03Z-
dc.date.available2014-12-08T15:13:03Z-
dc.date.issued2007-12-01en_US
dc.identifier.issn0741-3106en_US
dc.identifier.urihttp://dx.doi.org/10.1109/LED.2007.909850en_US
dc.identifier.urihttp://hdl.handle.net/11536/10062-
dc.description.abstractA new method of extracting the MOSFET series resistance R-sd is proposed. This method requires only simple dc measurements on a single test device. Experimental demonstration is presented, without requiring quantities such as gate-oxide thickness, physical gate length, or effective channel length. The merit of the method stems from the specifically arranged bias conditions in which the channel carrier mobility remains constant for high vertical electric fields. It is this unique property which, makes the proposed method suitable for short-channel devices.en_US
dc.language.isoen_USen_US
dc.subjectmobilityen_US
dc.subjectMOSFETen_US
dc.subjectseries resistanceen_US
dc.titleA constant-mobility method to enable MOSFET series-resistance extractionen_US
dc.typeArticleen_US
dc.identifier.doi10.1109/LED.2007.909850en_US
dc.identifier.journalIEEE ELECTRON DEVICE LETTERSen_US
dc.citation.volume28en_US
dc.citation.issue12en_US
dc.citation.spage1132en_US
dc.citation.epage1134en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000251429800019-
dc.citation.woscount13-
Appears in Collections:Articles


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