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dc.contributor.authorChiang, K. C.en_US
dc.contributor.authorCheng, C. H.en_US
dc.contributor.authorJhou, K. Y.en_US
dc.contributor.authorPan, H. C.en_US
dc.contributor.authorHsiao, C. N.en_US
dc.contributor.authorChou, C. P.en_US
dc.contributor.authorMcAlister, S. P.en_US
dc.contributor.authorChin, Alberten_US
dc.contributor.authorHwang, H. L.en_US
dc.date.accessioned2014-12-08T15:13:35Z-
dc.date.available2014-12-08T15:13:35Z-
dc.date.issued2007-08-01en_US
dc.identifier.issn0741-3106en_US
dc.identifier.urihttp://dx.doi.org/10.1109/LED.2007.900876en_US
dc.identifier.urihttp://hdl.handle.net/11536/10488-
dc.description.abstractWe have studied the stress reliability of low-energy-bandgap high-kappa. SrTiO3 metal-insulator-metal capacitors under constant voltage stress. By using a high-work-function Ni electrode (5.1 eV), we reduced the degrading effects of stress on the capacitance variation (Delta C/C), the quadratic voltage coefficient of capacitance (VCC-alpha), and the long-term reliability, in contrast with using a TaN. The improved stress reliability for the Ni electrode capacitors is attributed to a reduction of carrier injection and trapping.en_US
dc.language.isoen_USen_US
dc.subjecthigh work functionen_US
dc.subjectmetal-insulator-metal (MIM)en_US
dc.subjectNien_US
dc.subjectreliabilityen_US
dc.subjectSrTiO3 (STO)en_US
dc.titleUse of a high-work-function ni electrode to improve the stress reliability of Analog SrTiO3 metal-insulator-metal capacitorsen_US
dc.typeArticleen_US
dc.identifier.doi10.1109/LED.2007.900876en_US
dc.identifier.journalIEEE ELECTRON DEVICE LETTERSen_US
dc.citation.volume28en_US
dc.citation.issue8en_US
dc.citation.spage694en_US
dc.citation.epage696en_US
dc.contributor.department機械工程學系zh_TW
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Mechanical Engineeringen_US
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000248315400009-
dc.citation.woscount20-
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