標題: | High-resolution through-focus metric with two-pitch grating target |
作者: | Shyu, Deh-Ming Lu, Mao-Hong Ko, Chun-Hung 光電工程學系 Department of Photonics |
公開日期: | 1-八月-2007 |
摘要: | Through-focus focus-metric is a method that is used to analyze images on a fixed plane with the help of focus-metric values when the target moves through the focus. In this study, an optical microscope having a magnification of 250x is constructed. A two-pitch grating target is imaged on a CCD detector and through-focus image data are measured. In addition, the optical field on the CCD detector is simulated using the boundary element method and physical optics propagation. By comparing the measured focus-metric signatures with the simulated signatures, information regarding the linewidth is obtained. The results show that the through-focus focus-metric method is a very sensitive method that can be used for measuring parameters such as the linewidth. Thus, a nanoscale resolution can be achieved. (C) 2007 Elsevier B.V. All rights reserved. |
URI: | http://dx.doi.org/10.1016/j.optcom.2007.04.001 http://hdl.handle.net/11536/10491 |
ISSN: | 0030-4018 |
DOI: | 10.1016/j.optcom.2007.04.001 |
期刊: | OPTICS COMMUNICATIONS |
Volume: | 276 |
Issue: | 1 |
起始頁: | 31 |
結束頁: | 36 |
顯示於類別: | 期刊論文 |