完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | CHAO Mango C.-T. | en_US |
dc.contributor.author | CHEN Kuo-An | en_US |
dc.contributor.author | CHANG Tsung-Wei | en_US |
dc.date.accessioned | 2014-12-16T06:14:50Z | - |
dc.date.available | 2014-12-16T06:14:50Z | - |
dc.date.issued | 2014-02-20 | en_US |
dc.identifier.govdoc | G06F017/50 | zh_TW |
dc.identifier.uri | http://hdl.handle.net/11536/104950 | - |
dc.description.abstract | A method for adjusting a layout of an integrated circuit includes a first layer, a second layer, a target metal line, and a first non-target metal line. The integrated circuit is configured for a focused ion beam (FIB) detection to the target metal line. The method includes the steps of: disposing the first non-target metal line on the first layer; disposing the target metal line on the second layer; and adjusting one of the target metal line and the first non-target metal line such that the target metal line can be detected by the FIB detection. | zh_TW |
dc.language.iso | zh_TW | en_US |
dc.title | METHOD FOR ADJUSTING A LAYOUT OF AN INTEGRATED CIRCUIT | zh_TW |
dc.type | Patents | en_US |
dc.citation.patentcountry | USA | zh_TW |
dc.citation.patentnumber | 20140053122 | zh_TW |
顯示於類別: | 專利資料 |