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dc.contributor.authorCHAO Mango C.-T.en_US
dc.contributor.authorCHEN Kuo-Anen_US
dc.contributor.authorCHANG Tsung-Weien_US
dc.date.accessioned2014-12-16T06:14:50Z-
dc.date.available2014-12-16T06:14:50Z-
dc.date.issued2014-02-20en_US
dc.identifier.govdocG06F017/50zh_TW
dc.identifier.urihttp://hdl.handle.net/11536/104950-
dc.description.abstractA method for adjusting a layout of an integrated circuit includes a first layer, a second layer, a target metal line, and a first non-target metal line. The integrated circuit is configured for a focused ion beam (FIB) detection to the target metal line. The method includes the steps of: disposing the first non-target metal line on the first layer; disposing the target metal line on the second layer; and adjusting one of the target metal line and the first non-target metal line such that the target metal line can be detected by the FIB detection.zh_TW
dc.language.isozh_TWen_US
dc.titleMETHOD FOR ADJUSTING A LAYOUT OF AN INTEGRATED CIRCUITzh_TW
dc.typePatentsen_US
dc.citation.patentcountryUSAzh_TW
dc.citation.patentnumber20140053122zh_TW
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