標題: | GaN HEMT with Nitrogen-Rich Tungsten Nitride Schottky Gate and Method of Forming the Same |
作者: | Chang, Edward Yi Lu, Chung-Yu |
公開日期: | 10-三月-2011 |
摘要: | A GaN HEMT with Schottky gate is disclosed. The GaN HEMT sequentially has a GaN layer, an AlGaN layer, and a Schottky gate on a substrate, and a source and a drain on two sides of the Schottky gate. The Schottky gate is made by a material of nitrogen-rich tungsten nitride, which has a nitrogen content of about 0.5 molar ratio. |
官方說明文件#: | H01L029/20 H01L029/778 H01L021/335 |
URI: | http://hdl.handle.net/11536/105329 |
專利國: | USA |
專利號碼: | 20110057196 |
顯示於類別: | 專利資料 |