Plasma device for liquid crystal alignment

標題:	Plasma device for liquid crystal alignment
作者:	Chao, Ru-Pin Wu, Hsin-Ying Wang, Chih-Chieh Chang, Shao-Ju Hwang, Jenn-Chang Kou, Chwung-Shan Wu, Kuen-Yi Lee, An-Ping Wei, Hsiao-Kuan
公開日期:	5-六月-2008
摘要:	A device utilizes a plasma for a liquid crystal alignment. The alignment is processed in a vacuum chamber in a simple way. A general chemical vapor deposition is coordinated to reduce cost. The present invention is a novel contactless process avoiding particle contamination, residual static charge and scratch. And multiple are as of the present invention can be used for alignment.
官方說明文件#:	H05H001/46
URI:	http://hdl.handle.net/11536/105596
專利國:	USA
專利號碼:	20080129207
顯示於類別：	專利資料

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