標題: Schottky structure in GaAs semiconductor device
作者: Cheng-Shih, Lee
Yi, Chang
公開日期: 29-一月-2004
摘要: The present invention provides a Schottky Structure in gallium arsenide (GaAs) semiconductor device, which comprises a gallium arsenide (GaAs) semiconductor substrate, a titanium (Ti) layer on a surface of said gallium arsenide (GaAs) semiconductor substrate to form Schottky contact, a diffusion barrier layer on a surface of said titanium (Ti) layer to block metal diffusion, and a first copper layer on a surface of said diffusion barrier layer.
官方說明文件#: H01L027/095
URI: http://hdl.handle.net/11536/105781
專利國: USA
專利號碼: 20040016984
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