標題: Controlling contaminants with enhanced gas leak detection
作者: Li, Shou-Nan
Leu, Gen-Hou
Yen, Shaw-Yi
Chiou, Shin-Fu
Yu, Sheng-Jen
Hsu, Chang-Fu
交大名義發表
National Chiao Tung University
公開日期: 1-七月-2007
摘要: In semiconductor and optoelectronics manufacturing, many hazardous gases are used. Quickly finding-and terminating the source of such airborne molecular contaminants (AMC) are essential for the safety and well-being of employees, the general public, and fab operations. One challenge when trying to quickly resolve a hazardous gas leak is being able to detect concentrations that are below the typical permissible exposure limits of open-area gas sensors. To address the problem of detecting very low concentration levels (1 similar to 10ppb), a gas leak detection system (GLDS) was developed and on-site teste in 8 '' and 12 '' fabs. The results demonstrated its effectiveness to immediately locate the source of the leak and thus reduce potential fab losses.
URI: http://hdl.handle.net/11536/10602
ISSN: 0038-111X
期刊: SOLID STATE TECHNOLOGY
Volume: 50
Issue: 7
起始頁: 89
結束頁: +
顯示於類別:期刊論文