標題: | Controlling contaminants with enhanced gas leak detection |
作者: | Li, Shou-Nan Leu, Gen-Hou Yen, Shaw-Yi Chiou, Shin-Fu Yu, Sheng-Jen Hsu, Chang-Fu 交大名義發表 National Chiao Tung University |
公開日期: | 1-Jul-2007 |
摘要: | In semiconductor and optoelectronics manufacturing, many hazardous gases are used. Quickly finding-and terminating the source of such airborne molecular contaminants (AMC) are essential for the safety and well-being of employees, the general public, and fab operations. One challenge when trying to quickly resolve a hazardous gas leak is being able to detect concentrations that are below the typical permissible exposure limits of open-area gas sensors. To address the problem of detecting very low concentration levels (1 similar to 10ppb), a gas leak detection system (GLDS) was developed and on-site teste in 8 '' and 12 '' fabs. The results demonstrated its effectiveness to immediately locate the source of the leak and thus reduce potential fab losses. |
URI: | http://hdl.handle.net/11536/10602 |
ISSN: | 0038-111X |
期刊: | SOLID STATE TECHNOLOGY |
Volume: | 50 |
Issue: | 7 |
起始頁: | 89 |
結束頁: | + |
Appears in Collections: | Articles |