完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | Li, Shou-Nan | en_US |
dc.contributor.author | Leu, Gen-Hou | en_US |
dc.contributor.author | Yen, Shaw-Yi | en_US |
dc.contributor.author | Chiou, Shin-Fu | en_US |
dc.contributor.author | Yu, Sheng-Jen | en_US |
dc.contributor.author | Hsu, Chang-Fu | en_US |
dc.date.accessioned | 2014-12-08T15:13:42Z | - |
dc.date.available | 2014-12-08T15:13:42Z | - |
dc.date.issued | 2007-07-01 | en_US |
dc.identifier.issn | 0038-111X | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/10602 | - |
dc.description.abstract | In semiconductor and optoelectronics manufacturing, many hazardous gases are used. Quickly finding-and terminating the source of such airborne molecular contaminants (AMC) are essential for the safety and well-being of employees, the general public, and fab operations. One challenge when trying to quickly resolve a hazardous gas leak is being able to detect concentrations that are below the typical permissible exposure limits of open-area gas sensors. To address the problem of detecting very low concentration levels (1 similar to 10ppb), a gas leak detection system (GLDS) was developed and on-site teste in 8 '' and 12 '' fabs. The results demonstrated its effectiveness to immediately locate the source of the leak and thus reduce potential fab losses. | en_US |
dc.language.iso | en_US | en_US |
dc.title | Controlling contaminants with enhanced gas leak detection | en_US |
dc.type | Article | en_US |
dc.identifier.journal | SOLID STATE TECHNOLOGY | en_US |
dc.citation.volume | 50 | en_US |
dc.citation.issue | 7 | en_US |
dc.citation.spage | 89 | en_US |
dc.citation.epage | + | en_US |
dc.contributor.department | 交大名義發表 | zh_TW |
dc.contributor.department | National Chiao Tung University | en_US |
dc.identifier.wosnumber | WOS:000248268100012 | - |
dc.citation.woscount | 2 | - |
顯示於類別: | 期刊論文 |