Polybenzoxazine as a mold-release agent for nanoimprint lithography

doi:10.1021/la062921e

完整後設資料紀錄

DC 欄位	值	語言
dc.contributor.author	Wang, Chih-Feng	en_US
dc.contributor.author	Chiou, Shih-Feng	en_US
dc.contributor.author	Ko, Fu-Hsiang	en_US
dc.contributor.author	Chen, Jem-Kun	en_US
dc.contributor.author	Chou, Cheng-Tung	en_US
dc.contributor.author	Huang, Chih-Feng	en_US
dc.contributor.author	Kuo, Shiao-Wei	en_US
dc.contributor.author	Chang, Feng-Chih	en_US
dc.date.accessioned	2014-12-08T15:14:01Z	-
dc.date.available	2014-12-08T15:14:01Z	-
dc.date.issued	2007-05-22	en_US
dc.identifier.issn	0743-7463	en_US
dc.identifier.uri	http://dx.doi.org/10.1021/la062921e	en_US
dc.identifier.uri	http://hdl.handle.net/11536/10786	-
dc.description.abstract	One of the most important tasks remaining to be resolved in nanoimprint lithography is the elimination of the resist sticking to the mold during demolding. Previously, the main approach was to apply a thin layer of fluorinated alkyl silane mold-release agent on the surface on the mold; however, this involves complicated steps and high costs. The low surface free energy material polybenzoxazine provides an efficient mold-release agent for silicon molds that is easier to process, costs less, and has no side reactions.	en_US
dc.language.iso	en_US	en_US
dc.title	Polybenzoxazine as a mold-release agent for nanoimprint lithography	en_US
dc.type	Article	en_US
dc.identifier.doi	10.1021/la062921e	en_US
dc.identifier.journal	LANGMUIR	en_US
dc.citation.volume	23	en_US
dc.citation.issue	11	en_US
dc.citation.spage	5868	en_US
dc.citation.epage	5871	en_US
dc.contributor.department	材料科學與工程學系奈米科技碩博班	zh_TW
dc.contributor.department	應用化學系	zh_TW
dc.contributor.department	Graduate Program of Nanotechnology , Department of Materials Science and Engineering	en_US
dc.contributor.department	Department of Applied Chemistry	en_US
dc.identifier.wosnumber	WOS:000246456700007	-
dc.citation.woscount	33	-
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