標題: Thermal leakage improvement by using a high-work-function ni electrode in high-kappa TiHfO metal-insulator-metal capacitors
作者: Chiang, K. C.
Huang, C. C.
Pan, H. C.
Hsiao, C. N.
Lin, J. W.
Hsieh, I. J.
Cheng, C. H.
Chou, C. P.
Chin, A.
Hwang, H. L.
McAlister, S. P.
機械工程學系
奈米科技中心
Department of Mechanical Engineering
Center for Nanoscience and Technology
公開日期: 2007
摘要: An unavoidable drawback when using high-kappa dielectrics in capacitors is the small bandgap and the related reduction in the band-offset, which results in a large leakage current at elevated temperatures. We report improvements in the thermal leakage current by using Ni as a high-work-function top electrode for high-kappa TiHfO capacitors. This avoids sacrificing the overall kappa value by using a multilayer or laminate structure and results in better voltage linearity, which is important for analog/radio frequency integrated circuits. (c) 2007 The Electrochemical Society.
URI: http://hdl.handle.net/11536/11329
http://dx.doi.org/10.1149/1.2422874
ISSN: 0013-4651
DOI: 10.1149/1.2422874
期刊: JOURNAL OF THE ELECTROCHEMICAL SOCIETY
Volume: 154
Issue: 3
起始頁: G54
結束頁: G57
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