標題: | Thermal leakage improvement by using a high-work-function ni electrode in high-kappa TiHfO metal-insulator-metal capacitors |
作者: | Chiang, K. C. Huang, C. C. Pan, H. C. Hsiao, C. N. Lin, J. W. Hsieh, I. J. Cheng, C. H. Chou, C. P. Chin, A. Hwang, H. L. McAlister, S. P. 機械工程學系 奈米科技中心 Department of Mechanical Engineering Center for Nanoscience and Technology |
公開日期: | 2007 |
摘要: | An unavoidable drawback when using high-kappa dielectrics in capacitors is the small bandgap and the related reduction in the band-offset, which results in a large leakage current at elevated temperatures. We report improvements in the thermal leakage current by using Ni as a high-work-function top electrode for high-kappa TiHfO capacitors. This avoids sacrificing the overall kappa value by using a multilayer or laminate structure and results in better voltage linearity, which is important for analog/radio frequency integrated circuits. (c) 2007 The Electrochemical Society. |
URI: | http://hdl.handle.net/11536/11329 http://dx.doi.org/10.1149/1.2422874 |
ISSN: | 0013-4651 |
DOI: | 10.1149/1.2422874 |
期刊: | JOURNAL OF THE ELECTROCHEMICAL SOCIETY |
Volume: | 154 |
Issue: | 3 |
起始頁: | G54 |
結束頁: | G57 |
Appears in Collections: | Articles |
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