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dc.contributor.authorChiang, K. C.en_US
dc.contributor.authorHuang, C. C.en_US
dc.contributor.authorPan, H. C.en_US
dc.contributor.authorHsiao, C. N.en_US
dc.contributor.authorLin, J. W.en_US
dc.contributor.authorHsieh, I. J.en_US
dc.contributor.authorCheng, C. H.en_US
dc.contributor.authorChou, C. P.en_US
dc.contributor.authorChin, A.en_US
dc.contributor.authorHwang, H. L.en_US
dc.contributor.authorMcAlister, S. P.en_US
dc.date.accessioned2014-12-08T15:15:03Z-
dc.date.available2014-12-08T15:15:03Z-
dc.date.issued2007en_US
dc.identifier.issn0013-4651en_US
dc.identifier.urihttp://hdl.handle.net/11536/11329-
dc.identifier.urihttp://dx.doi.org/10.1149/1.2422874en_US
dc.description.abstractAn unavoidable drawback when using high-kappa dielectrics in capacitors is the small bandgap and the related reduction in the band-offset, which results in a large leakage current at elevated temperatures. We report improvements in the thermal leakage current by using Ni as a high-work-function top electrode for high-kappa TiHfO capacitors. This avoids sacrificing the overall kappa value by using a multilayer or laminate structure and results in better voltage linearity, which is important for analog/radio frequency integrated circuits. (c) 2007 The Electrochemical Society.en_US
dc.language.isoen_USen_US
dc.titleThermal leakage improvement by using a high-work-function ni electrode in high-kappa TiHfO metal-insulator-metal capacitorsen_US
dc.typeArticleen_US
dc.identifier.doi10.1149/1.2422874en_US
dc.identifier.journalJOURNAL OF THE ELECTROCHEMICAL SOCIETYen_US
dc.citation.volume154en_US
dc.citation.issue3en_US
dc.citation.spageG54en_US
dc.citation.epageG57en_US
dc.contributor.department機械工程學系zh_TW
dc.contributor.department奈米科技中心zh_TW
dc.contributor.departmentDepartment of Mechanical Engineeringen_US
dc.contributor.departmentCenter for Nanoscience and Technologyen_US
dc.identifier.wosnumberWOS:000243977500052-
dc.citation.woscount20-
Appears in Collections:Articles


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