完整後設資料紀錄
DC 欄位語言
dc.contributor.authorChen, C. C.en_US
dc.contributor.authorKao, H. L.en_US
dc.contributor.authorChin, Alberten_US
dc.date.accessioned2014-12-08T15:15:40Z-
dc.date.available2014-12-08T15:15:40Z-
dc.date.issued2006-10-01en_US
dc.identifier.issn0895-2477en_US
dc.identifier.urihttp://dx.doi.org/10.1002/mop.21813en_US
dc.identifier.urihttp://hdl.handle.net/11536/11705-
dc.description.abstractWe have studied the electric stress effect on DC-RF performance degradation of 64 gate fingers 0.18-mu m RF MOSFETs. The fresh devices show good transistor's DC to RF characteristics of small sub-threshold swing of 85 mV/dec, large drive current (I-d,I-sat) of 500 mu A/mu m, high unity-gain cut-off frequency (f(t)) of 47 GHz, and low minimum not. se figure (NFmin) of 1.3 dB at 10 GHz. The hot carrier stress for 20% I-d,I-sat reduction causes DC g(m) and r(o) degradation as well as the lower RF current gain by 2.35 dB, f(t) reduction to 35.7 GHz, increasing NFmin to 1.7 dB at 10 GHz and poor output impedance matching. (C) 2006 Wiley Periodicals, Inc.en_US
dc.language.isoen_USen_US
dc.subjectstressen_US
dc.subjectI-Ven_US
dc.subjectcurrent gainen_US
dc.subjectS parametersen_US
dc.subjectNFminen_US
dc.titleElectric stress effect on DC-RF performance degradation of 0.18-mu m mosfetsen_US
dc.typeArticleen_US
dc.identifier.doi10.1002/mop.21813en_US
dc.identifier.journalMICROWAVE AND OPTICAL TECHNOLOGY LETTERSen_US
dc.citation.volume48en_US
dc.citation.issue10en_US
dc.citation.spage1916en_US
dc.citation.epage1919en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000239682100003-
dc.citation.woscount0-
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