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dc.contributor.authorKer, Ming-Douen_US
dc.contributor.authorChen, Shih-Lunen_US
dc.date.accessioned2014-12-08T15:15:40Z-
dc.date.available2014-12-08T15:15:40Z-
dc.date.issued2006-10-01en_US
dc.identifier.issn0018-9200en_US
dc.identifier.urihttp://dx.doi.org/10.1109/JSSC.2006.881546en_US
dc.identifier.urihttp://hdl.handle.net/11536/11710-
dc.description.abstractAn nMOS-blocking technique for mixed-voltage I/O buffer realized with only 1 x V-DD devices can receive 2 x V-DD, 3 x V-DD, and even 4 x V-DD input signal without the gate-oxide reliability issue is proposed. In this paper, the 2 x V-DD input tolerant mixed-voltage I/O buffer by using the nMOS-blocking technique has been verified in a 0.25-mu m 2.5-V CMOS process to serve 2.5/5-V mixed-voltage interface. The 3 x V-DD input tolerant mixed-voltage I/O buffer by using the nMOS-blocking technique has been verified in a 0.13-mu m 1-V CMOS process to serve 1/3-V mixed-voltage interface. The proposed nMOS-blocking technique can be extended to design the 4 x V-DD, 5 x V-DD, and even 6 x V-DD input tolerant mixed-voltage I/O buffers. The limitation of the nMOS-blocking technique is the breakdown voltage of the pn-junction in the given CMOS process.en_US
dc.language.isoen_USen_US
dc.subjectgate-oxide reliabilityen_US
dc.subjecthot-carrier degradationen_US
dc.subjectinterfaceen_US
dc.subjectjunction breakdownen_US
dc.subjectmixed-voltage I/O bufferen_US
dc.titleDesign of mixed-voltage I/O buffer by using NMOS-blocking techniqueen_US
dc.typeArticleen_US
dc.identifier.doi10.1109/JSSC.2006.881546en_US
dc.identifier.journalIEEE JOURNAL OF SOLID-STATE CIRCUITSen_US
dc.citation.volume41en_US
dc.citation.issue10en_US
dc.citation.spage2324en_US
dc.citation.epage2333en_US
dc.contributor.department電機學院zh_TW
dc.contributor.departmentCollege of Electrical and Computer Engineeringen_US
dc.identifier.wosnumberWOS:000240697600016-
dc.citation.woscount19-
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