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dc.contributor.authorChang, Yi-Anen_US
dc.contributor.authorKo, Tsung-Shineen_US
dc.contributor.authorChen, Jun-Rongen_US
dc.contributor.authorLai, Fang-Ien_US
dc.contributor.authorYu, Chun-Lungen_US
dc.contributor.authorWu, I-Tsungen_US
dc.contributor.authorKuo, Hao-Chungen_US
dc.contributor.authorKuo, Yen-Kuangen_US
dc.contributor.authorLaih, Li-Wenen_US
dc.contributor.authorLaih, Li-Horngen_US
dc.contributor.authorLu, Tin-Changen_US
dc.contributor.authorWang, Shing-Chungen_US
dc.date.accessioned2014-12-08T15:15:42Z-
dc.date.available2014-12-08T15:15:42Z-
dc.date.issued2006-10-01en_US
dc.identifier.issn0268-1242en_US
dc.identifier.urihttp://dx.doi.org/10.1088/0268-1242/21/10/023en_US
dc.identifier.urihttp://hdl.handle.net/11536/11728-
dc.description.abstractIn this study, the carrier blocking effect on 850 nm InAlGaAs/AlGaAs vertical-cavity surface-emitting layers (VCSELs) was theoretically and experimentally investigated. By means of inserting a high-bandgap electron blocking layer, which was either 10 nm thick Al0.75Ga0.25As or 13 nm thick Al0.9Ga0.1As, on the p-side of a quantum-well active region, the laser output performance was theoretically found to be improved. VCSELs with and without an electron blocking layer were also experimentally demonstrated. It was found that the threshold current was reduced from 1.47 to 1.33 mA and the slope efficiency was increased from 0.37 to 0.53 mW mA(-1) by inserting a 10 nm thick Al0.75Ga0.25As electron blocking layer. Also, the device became less sensitive to the device temperature, where the amount of increase in the threshold current at an elevated temperature of 95 degrees C was only 0.27 mA and the slope efficiency dropped by only 24.5%. A peak frequency response of nearly 9 GHz at 5 mA, measured from relative intensity noise (RIN), was obtained in these VCSEL devices.en_US
dc.language.isoen_USen_US
dc.titleThe carrier blocking effect on 850 nm InAlGaAs/AlGaAs vertical-cavity surface-emitting lasersen_US
dc.typeArticleen_US
dc.identifier.doi10.1088/0268-1242/21/10/023en_US
dc.identifier.journalSEMICONDUCTOR SCIENCE AND TECHNOLOGYen_US
dc.citation.volume21en_US
dc.citation.issue10en_US
dc.citation.spage1488en_US
dc.citation.epage1494en_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.identifier.wosnumberWOS:000242578100023-
dc.citation.woscount5-
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