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DC 欄位語言
dc.contributor.authorKer, Ming-Douen_US
dc.contributor.authorChen, Shih-Lunen_US
dc.contributor.authorTsai, Chia-Shengen_US
dc.date.accessioned2014-12-08T15:15:50Z-
dc.date.available2014-12-08T15:15:50Z-
dc.date.issued2006-09-01en_US
dc.identifier.issn1057-7122en_US
dc.identifier.urihttp://dx.doi.org/10.1109/TCSI.2006.882816en_US
dc.identifier.urihttp://hdl.handle.net/11536/11816-
dc.description.abstractOverview on the prior designs of the mixed-voltage I/O buffers is provided in this work. A new 2.5/5-V mixed-voltage I/O buffer realized with only thin gate-oxide devices is proposed. The new proposed mixed-voltage I/O buffer with simpler dynamic n-well bias circuit and gate-tracking circuit can prevent the undesired leakage current paths and the gate-oxide -reliability problem, which occur in the conventional CMOS I/O buffer. The new mixed-voltage I/O buffer has been fabricated and verified in a 0.25-mu m CMOS process to serve 2.5/5-V I/O interface. Besides, another 2.5/5-V mixed-voltage I/O buffer without the subthreshold leakage problem for high-speed applications is also presented in this work. The speed, power consumption, area, and-noise among these mixed-voltage I/O buffers are also compared and discussed. The new proposed mixed-voltage I/O buffers can be easily scaled toward 0.18- mu m (or below) CMOS processes to serve other mixed-voltage I/O interfaces, such as 1.8/3.3-V interface.en_US
dc.language.isoen_USen_US
dc.subjectgate-oxide reliabilityen_US
dc.subjectgate-tracking circuiten_US
dc.subjectinterfaceen_US
dc.subjectmixed-voltage I/O bufferen_US
dc.titleOverview and design of mixed-voltage I/O buffers, with low-voltage thin-oxide CMOS transistorsen_US
dc.typeArticleen_US
dc.identifier.doi10.1109/TCSI.2006.882816en_US
dc.identifier.journalIEEE TRANSACTIONS ON CIRCUITS AND SYSTEMS I-REGULAR PAPERSen_US
dc.citation.volume53en_US
dc.citation.issue9en_US
dc.citation.spage1934en_US
dc.citation.epage1945en_US
dc.contributor.department電機學院zh_TW
dc.contributor.departmentCollege of Electrical and Computer Engineeringen_US
dc.identifier.wosnumberWOS:000240757000008-
dc.citation.woscount33-
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