標題: | High-temperature magnetoresistance study of a magnetic tunnel junction |
作者: | Chen, D. C. Yao, Y. D. Chen, C. M. Hung, James Chen, Y. S. Wang, W. H. Chen, W. C. Kao, M. J. 材料科學與工程學系 Department of Materials Science and Engineering |
關鍵字: | Magnetic tunnel junction;Tunneling magnetoresistance;Temperature dependence;Thermal annealing |
公開日期: | 1-九月-2006 |
摘要: | The thermal stability and the spin transportation phenomenon at room temperature and 140 degrees C of a series of magnetic tunneling junctions with the structure of bottom electrode/PtMn/Pinned layer/ AlO(x)/CoFe/NiFe/top electrode have been investigated. The MR ratio decreases from 33.5% at room temperature to 29% at 140 degrees C. The MR ratio at room temperature increases roughly 0.8% after thermal treatment at temperatures above 60 degrees C. This is related to the thermal relaxation of the strains existing in the samples. (C) 2006 Elsevier B.V. All rights reserved. |
URI: | http://dx.doi.org/10.1016/j.jmmm.2006.02.062 http://hdl.handle.net/11536/11837 |
ISSN: | 0304-8853 |
DOI: | 10.1016/j.jmmm.2006.02.062 |
期刊: | JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS |
Volume: | 304 |
Issue: | 1 |
起始頁: | E297 |
結束頁: | E299 |
顯示於類別: | 期刊論文 |