完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | Lee, CY | en_US |
dc.contributor.author | Li, SY | en_US |
dc.contributor.author | Lin, P | en_US |
dc.contributor.author | Tseng, TY | en_US |
dc.date.accessioned | 2014-12-08T15:16:39Z | - |
dc.date.available | 2014-12-08T15:16:39Z | - |
dc.date.issued | 2006-05-01 | en_US |
dc.identifier.issn | 1536-125X | en_US |
dc.identifier.uri | http://dx.doi.org/10.1109/TNANO.2006.874049 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/12280 | - |
dc.description.abstract | A field-emission triode based on the low-temperature (75 degrees C) and hydrothermally synthesized single-crystalline zinc-oxide nanowires; (ZnO NWs) grown on Si substrate with a silicon dioxide (SiO2) insulator was fabricated for the controllable field-emission device application. Field-emission measurement reveals that the ZnO NWs fabricated on the Si substrate exhibit a good emission property with the turn-on electric field and threshold electric field (current density of 1 mA/cm(2)) of 1.6 and 2.1 V/mu m, respectively, with a field enhancement factor beta of 3340. The field-emission properties of the ZnO NW-based triode exhibit the controllable characteristics. The well-controlled field-emission characteristics can be divided into three parts: gate leakage region, linear region, and saturation region. Therefore, this study provides a low-temperature field-emission triode fabrication process that is compatible with the Si-based microelectronic integration, and the field-emission measurements also reveal that the emission behavior can be well controlled by adopting the triode structure. | en_US |
dc.language.iso | en_US | en_US |
dc.subject | field-emission triode and device | en_US |
dc.subject | hydrothermal method | en_US |
dc.subject | nanowires (NWs) | en_US |
dc.subject | ZnO | en_US |
dc.title | Field-emission triode of low-temperature synthesized ZnO nanowires | en_US |
dc.type | Article | en_US |
dc.identifier.doi | 10.1109/TNANO.2006.874049 | en_US |
dc.identifier.journal | IEEE TRANSACTIONS ON NANOTECHNOLOGY | en_US |
dc.citation.volume | 5 | en_US |
dc.citation.issue | 3 | en_US |
dc.citation.spage | 216 | en_US |
dc.citation.epage | 219 | en_US |
dc.contributor.department | 材料科學與工程學系 | zh_TW |
dc.contributor.department | 電子工程學系及電子研究所 | zh_TW |
dc.contributor.department | Department of Materials Science and Engineering | en_US |
dc.contributor.department | Department of Electronics Engineering and Institute of Electronics | en_US |
dc.identifier.wosnumber | WOS:000237822400013 | - |
dc.citation.woscount | 21 | - |
顯示於類別: | 期刊論文 |