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dc.contributor.authorCheng, C. H.en_US
dc.contributor.authorChou, K. I.en_US
dc.contributor.authorHsu, H. H.en_US
dc.date.accessioned2015-07-21T08:29:37Z-
dc.date.available2015-07-21T08:29:37Z-
dc.date.issued2015-02-01en_US
dc.identifier.issn1533-4880en_US
dc.identifier.urihttp://dx.doi.org/10.1166/jnn.2015.9066en_US
dc.identifier.urihttp://hdl.handle.net/11536/123849-
dc.description.abstractWe demonstrate a low-voltage driven, indium gallium zinc oxide thin-film transistor using high-kappa LaAlO3 gate dielectric. A low V-T of 0.42 V, very small sub-threshold swing of 68 mV/dec, field-effect mobility of 4.1 cm(2)Ns and low operation voltage of 1.4 V were reached simultaneously in LaAlO3/IGZO TFT device. This low-power and small SS TFT has the potential for fast switching speed and low power applications.en_US
dc.language.isoen_USen_US
dc.subjectInGaZnOen_US
dc.subjectThin Film Transistoren_US
dc.subjectLaAlO3en_US
dc.subjectSub-Threshold Swingen_US
dc.titleLow-Voltage InGaZnO Thin Film Transistors with Small Sub-Threshold Swingen_US
dc.typeArticleen_US
dc.identifier.doi10.1166/jnn.2015.9066en_US
dc.identifier.journalJOURNAL OF NANOSCIENCE AND NANOTECHNOLOGYen_US
dc.citation.volume15en_US
dc.citation.spage1486en_US
dc.citation.epage1489en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000345054100080en_US
dc.citation.woscount0en_US
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