標題: Electrical characteristics and reliability of multi-channel polycrystalline silicon thin-film transistors
作者: Shieh, MS
Sang, JY
Chen, CY
Wang, SD
Lei, TF
電子工程學系及電子研究所
Department of Electronics Engineering and Institute of Electronics
關鍵字: multi-channel;gate control capability;poly-Si TFTs;electrical stress
公開日期: 1-四月-2006
摘要: We demonstrate the fabrication process and the electrical characteristics of n-channel polycrystalline silicon thin-film transistors (poly-Si TFTs) with different numbers of channel stripes.-The device's electrical characteristics, such as on-current, threshold voltage, and subthreshold swing, were improved by increasing the number of channel stripes due to the enhancement of gate control. However, the electric field strength near the drain side was enlarged in multi-channel structures, causing severe impact ionization. The degradation of device's reliability under various electrical stress conditions was suggested.
URI: http://dx.doi.org/10.1143/JJAP.45.3159
http://hdl.handle.net/11536/12415
ISSN: 0021-4922
DOI: 10.1143/JJAP.45.3159
期刊: JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS
Volume: 45
Issue: 4B
起始頁: 3159
結束頁: 3164
顯示於類別:會議論文


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