標題: | Electrical characteristics and reliability of multi-channel polycrystalline silicon thin-film transistors |
作者: | Shieh, MS Sang, JY Chen, CY Wang, SD Lei, TF 電子工程學系及電子研究所 Department of Electronics Engineering and Institute of Electronics |
關鍵字: | multi-channel;gate control capability;poly-Si TFTs;electrical stress |
公開日期: | 1-四月-2006 |
摘要: | We demonstrate the fabrication process and the electrical characteristics of n-channel polycrystalline silicon thin-film transistors (poly-Si TFTs) with different numbers of channel stripes.-The device's electrical characteristics, such as on-current, threshold voltage, and subthreshold swing, were improved by increasing the number of channel stripes due to the enhancement of gate control. However, the electric field strength near the drain side was enlarged in multi-channel structures, causing severe impact ionization. The degradation of device's reliability under various electrical stress conditions was suggested. |
URI: | http://dx.doi.org/10.1143/JJAP.45.3159 http://hdl.handle.net/11536/12415 |
ISSN: | 0021-4922 |
DOI: | 10.1143/JJAP.45.3159 |
期刊: | JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS |
Volume: | 45 |
Issue: | 4B |
起始頁: | 3159 |
結束頁: | 3164 |
顯示於類別: | 會議論文 |