Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Chou, Chia-Hsin | en_US |
dc.contributor.author | Chan, Wei-Sheng | en_US |
dc.contributor.author | Lee, I-Che | en_US |
dc.contributor.author | Wang, Chao-Lung | en_US |
dc.contributor.author | Wu, Chun-Yu | en_US |
dc.contributor.author | Yang, Po-Yu | en_US |
dc.contributor.author | Liao, Chan-Yu | en_US |
dc.contributor.author | Wang, Kuang-Yu | en_US |
dc.contributor.author | Cheng, Huang-Chung | en_US |
dc.date.accessioned | 2015-07-21T08:29:26Z | - |
dc.date.available | 2015-07-21T08:29:26Z | - |
dc.date.issued | 2015-04-01 | en_US |
dc.identifier.issn | 0741-3106 | en_US |
dc.identifier.uri | http://dx.doi.org/10.1109/LED.2015.2405760 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/124472 | - |
dc.description.abstract | High-performance polycrystalline-silicon nanowire (NW) thin-film transistors (TFTs) have been demonstrated via continuous-wave laser crystallization (CLC) to exhibit the low subthreshold swing of 216 mV/decade and high ON/OFF ratio of 1.6x10(9). In addition, the thermal stress of similar to 800 MPa induced from the CLC process also contributed to the single-crystal-like silicon NW CLC TFTs to achieve an excellent field-effect mobility of up to 900 cm(2)V(-1)s(-1). | en_US |
dc.language.iso | en_US | en_US |
dc.subject | Continuous-wave laser crystallization (CLC) | en_US |
dc.subject | polycrystalline silicon (poly-Si) | en_US |
dc.subject | nanowire (NW) | en_US |
dc.subject | thermal stress | en_US |
dc.subject | strained-silicon | en_US |
dc.title | High-Performance Single-Crystal-Like Strained-Silicon Nanowire Thin-Film Transistors via Continuous-Wave Laser Crystallization | en_US |
dc.type | Article | en_US |
dc.identifier.doi | 10.1109/LED.2015.2405760 | en_US |
dc.identifier.journal | IEEE ELECTRON DEVICE LETTERS | en_US |
dc.citation.volume | 36 | en_US |
dc.citation.spage | 348 | en_US |
dc.citation.epage | 350 | en_US |
dc.contributor.department | 電子工程學系及電子研究所 | zh_TW |
dc.contributor.department | Department of Electronics Engineering and Institute of Electronics | en_US |
dc.identifier.wosnumber | WOS:000351743900020 | en_US |
dc.citation.woscount | 0 | en_US |
Appears in Collections: | Articles |