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dc.contributor.authorChou, Chia-Hsinen_US
dc.contributor.authorChan, Wei-Shengen_US
dc.contributor.authorLee, I-Cheen_US
dc.contributor.authorWang, Chao-Lungen_US
dc.contributor.authorWu, Chun-Yuen_US
dc.contributor.authorYang, Po-Yuen_US
dc.contributor.authorLiao, Chan-Yuen_US
dc.contributor.authorWang, Kuang-Yuen_US
dc.contributor.authorCheng, Huang-Chungen_US
dc.date.accessioned2015-07-21T08:29:26Z-
dc.date.available2015-07-21T08:29:26Z-
dc.date.issued2015-04-01en_US
dc.identifier.issn0741-3106en_US
dc.identifier.urihttp://dx.doi.org/10.1109/LED.2015.2405760en_US
dc.identifier.urihttp://hdl.handle.net/11536/124472-
dc.description.abstractHigh-performance polycrystalline-silicon nanowire (NW) thin-film transistors (TFTs) have been demonstrated via continuous-wave laser crystallization (CLC) to exhibit the low subthreshold swing of 216 mV/decade and high ON/OFF ratio of 1.6x10(9). In addition, the thermal stress of similar to 800 MPa induced from the CLC process also contributed to the single-crystal-like silicon NW CLC TFTs to achieve an excellent field-effect mobility of up to 900 cm(2)V(-1)s(-1).en_US
dc.language.isoen_USen_US
dc.subjectContinuous-wave laser crystallization (CLC)en_US
dc.subjectpolycrystalline silicon (poly-Si)en_US
dc.subjectnanowire (NW)en_US
dc.subjectthermal stressen_US
dc.subjectstrained-siliconen_US
dc.titleHigh-Performance Single-Crystal-Like Strained-Silicon Nanowire Thin-Film Transistors via Continuous-Wave Laser Crystallizationen_US
dc.typeArticleen_US
dc.identifier.doi10.1109/LED.2015.2405760en_US
dc.identifier.journalIEEE ELECTRON DEVICE LETTERSen_US
dc.citation.volume36en_US
dc.citation.spage348en_US
dc.citation.epage350en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000351743900020en_US
dc.citation.woscount0en_US
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