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dc.contributor.authorKu, JTen_US
dc.contributor.authorKuo, MCen_US
dc.contributor.authorShen, JLen_US
dc.contributor.authorChiu, KCen_US
dc.contributor.authorYang, THen_US
dc.contributor.authorLuo, GLen_US
dc.contributor.authorChang, CYen_US
dc.contributor.authorLin, YCen_US
dc.contributor.authorFu, CPen_US
dc.contributor.authorChuu, DSen_US
dc.contributor.authorChia, CHen_US
dc.contributor.authorChou, WCen_US
dc.date.accessioned2014-12-08T15:17:04Z-
dc.date.available2014-12-08T15:17:04Z-
dc.date.issued2006-03-15en_US
dc.identifier.issn0021-8979en_US
dc.identifier.urihttp://dx.doi.org/10.1063/1.2181267en_US
dc.identifier.urihttp://hdl.handle.net/11536/12482-
dc.description.abstractSeveral approaches have been employed to grow high-quality ZnSe epilayers on Ge/Ge0.95Si0.05/Ge0.9Si0.1/Si virtual substrates. The ZnSe epilayers were characterized by photoluminescence spectroscopy. Migration enhanced epitaxy and inserting an in situ thermal annealing ZnSe buffer layer effectively reduced the intensity of deep level emissions from the ZnSe epilayer grown on a 6 degrees-tilted Ge/Ge0.95Si0.05/Ge0.9Si0.1/Si virtual substrate. Optimized conditions for growing high-quality ZnSe were used to deposit ZnCdSe/ZnSe multiple quantum wells on Ge/Ge0.95Si0.05/Ge0.9Si0.1/Si virtual substrates. Photoluminescence spectroscopy revealed quantum-confinement effect in the ZnCdSe multiple quantum wells. The evolution of the exciton emission peak energy and the linewidth as a function of temperature indicate a low density of localized sites in the sample with a well width of 1 nm. In the high-temperature regime, the thermal quenching of the excitonic emission intensity from ZnCdSe quantum well structures was governed by the thermal activation of carriers from quantum-well-confined states into barrier states. (c) 2006 American Institute of Physics.en_US
dc.language.isoen_USen_US
dc.titleOptical characterization of ZnSe epilayers and ZnCdSe/ZnSe quantum wells grown on Ge/Ge0.95Si0.05/Ge0.9Si0.1/Si virtual substratesen_US
dc.typeArticleen_US
dc.identifier.doi10.1063/1.2181267en_US
dc.identifier.journalJOURNAL OF APPLIED PHYSICSen_US
dc.citation.volume99en_US
dc.citation.issue6en_US
dc.citation.epageen_US
dc.contributor.department電子物理學系zh_TW
dc.contributor.departmentDepartment of Electrophysicsen_US
dc.identifier.wosnumberWOS:000236464400015-
dc.citation.woscount5-
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