完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | Zeng, Yuping | en_US |
dc.contributor.author | Kuo, Chien-I | en_US |
dc.contributor.author | Hsu, Chingyi | en_US |
dc.contributor.author | Najmzadeh, Mohammad | en_US |
dc.contributor.author | Sachid, Angada | en_US |
dc.contributor.author | Kapadia, Rehan | en_US |
dc.contributor.author | Yeung, Chunwing | en_US |
dc.contributor.author | Chang, Edward | en_US |
dc.contributor.author | Hu, Chenming | en_US |
dc.contributor.author | Javey, Ali | en_US |
dc.date.accessioned | 2015-07-21T08:29:18Z | - |
dc.date.available | 2015-07-21T08:29:18Z | - |
dc.date.issued | 2015-05-01 | en_US |
dc.identifier.issn | 1536-125X | en_US |
dc.identifier.uri | http://dx.doi.org/10.1109/TNANO.2015.2419232 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/124841 | - |
dc.description.abstract | A type-III (broken gap) band alignment heterojunction vertical in-line InAs/AlSb/GaSb tunnel FET, including a 2-nm-thin AlSb tunneling barrier is demonstrated. The impact of overlap and underlap gate is studied experimentally and supported further by quasi-stationary 2-D TCAD Sentaurus device simulations. Hydrogen silsesquioxane is used as a novel mechanical support structure to suspend the 10-nm-thin InAs drain with enough undercut to be able to demonstrate an overlap gate architecture. The overlap gate InAs/AlSb/GaSb TFET shows an ON current density of 22 mu A/mu m(2) at V-GS = V-DS = 0.4 V and the subthreshold slope is 194 mV/decade at room temperature and 46 mV/decade at 100 K. | en_US |
dc.language.iso | en_US | en_US |
dc.subject | Heterojunction | en_US |
dc.subject | nanofabrication | en_US |
dc.subject | TCAD simulation | en_US |
dc.subject | tunneling barrier | en_US |
dc.subject | type III (broken gap) band alignment | en_US |
dc.subject | vertical in-line tunnel FET | en_US |
dc.title | Quantum Well InAs/AlSb/GaSb Vertical Tunnel FET With HSQ Mechanical Support | en_US |
dc.type | Article | en_US |
dc.identifier.doi | 10.1109/TNANO.2015.2419232 | en_US |
dc.identifier.journal | IEEE TRANSACTIONS ON NANOTECHNOLOGY | en_US |
dc.citation.volume | 14 | en_US |
dc.citation.spage | 580 | en_US |
dc.citation.epage | 584 | en_US |
dc.contributor.department | 交大名義發表 | zh_TW |
dc.contributor.department | National Chiao Tung University | en_US |
dc.identifier.wosnumber | WOS:000354453800022 | en_US |
dc.citation.woscount | 0 | en_US |
顯示於類別: | 期刊論文 |