On Characteristic Variability of 16-nm-Gate Bulk FinFET Devices Induced by Intrinsic Parameter Fluctuation and Process Variation Effect

Title:	On Characteristic Variability of 16-nm-Gate Bulk FinFET Devices Induced by Intrinsic Parameter Fluctuation and Process Variation Effect
Authors:	Chen, Chieh-Yang Li, Yiming Chen, Yu-Yu Chang, Han-Tung Hsu, Sheng-Chia Huang, Wen-Tsung Yang, Chin-Min Chen, Li-Wen 資訊工程學系 Department of Computer Science
Issue Date:	1-Jan-2013
Abstract:
URI:	http://hdl.handle.net/11536/124975
ISBN:	978-1-4799-0811-0; 978-1-4799-0812-7
ISSN:	1548-3770
Journal:	2013 71ST ANNUAL DEVICE RESEARCH CONFERENCE (DRC)
Begin Page:	137
End Page:	138
Appears in Collections:	Conferences Paper