標題: | Evolution of two-dimensional structure phase transitions (3 x 1) -> (2 x 1) and (1 x 1) -> (2 x 1) on hydrogen-terminated Si(100) surface |
作者: | Ferng, SS Lin, CT Yang, KM Hsieh, MF Lin, DS 物理研究所 Institute of Physics |
關鍵字: | STM;silicon;hydrogen;desorption;phase transition |
公開日期: | 1-三月-2006 |
摘要: | On the Si(100) surface, monohydride dimers (H-Si-Si-H or M-M) and dihydride (H-Si-H or D) species can form an ordered mixture with (3 x 1), (1 x 1) and (2 x 1) phases. Thermal annealing at elevated temperatures causes both the (3 x 1) and (1 x 1) domains to transform to the (2 x 1) monohydride phase. We utilize scanning tunneling microscopy to observe these two-dimensional structure phase transitions on the atomic scale. The results show that the coverage of the (3 x 1) and (1 x 1) domains decays linearly with a common half-life time of similar to 9.8 It at 570 K. In good agreement with a previous report, this finding suggests that the two different transitions are governed by the same reaction mechanism, i.e., the dihydride-pair recombination mechanism. |
URI: | http://dx.doi.org/10.1143/JJAP.45.2197 http://hdl.handle.net/11536/12550 |
ISSN: | 0021-4922 |
DOI: | 10.1143/JJAP.45.2197 |
期刊: | JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS |
Volume: | 45 |
Issue: | 3B |
起始頁: | 2197 |
結束頁: | 2199 |
顯示於類別: | 會議論文 |