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dc.contributor.authorYeh, KTen_US
dc.contributor.authorLin, CHen_US
dc.contributor.authorHu, JRen_US
dc.contributor.authorLoong, WAen_US
dc.date.accessioned2014-12-08T15:17:19Z-
dc.date.available2014-12-08T15:17:19Z-
dc.date.issued2006-03-01en_US
dc.identifier.issn0021-4922en_US
dc.identifier.urihttp://dx.doi.org/10.1143/JJAP.45.1566en_US
dc.identifier.urihttp://hdl.handle.net/11536/12592-
dc.description.abstractBecause the surface roughness of a thin film will cause light scattering, the reflectance (R) and transmittance (T) measured using a UV/visible (vis) spectrometer become lower than the actual values. The deviation becomes larger with increasing roughness and decreasing wavelength of incident light. Hence, it is necessary to correct measured R and T using roughness as a modification factor. The refraction (n) and extinction coefficient (k) obtained by the modified R-T method are closer to those results obtained using a variable angle spectroscopic ellipsometer (VASE), which provides more precise results than a n and k analyzer.en_US
dc.language.isoen_USen_US
dc.subjectrefractionen_US
dc.subjectextinction coefficienten_US
dc.subjectmodified R-T methoden_US
dc.subjectVASEen_US
dc.subjectn and k analyzeren_US
dc.titleModified reflectance-transmittance method for the metrology of thin film optical propertiesen_US
dc.typeArticleen_US
dc.identifier.doi10.1143/JJAP.45.1566en_US
dc.identifier.journalJAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERSen_US
dc.citation.volume45en_US
dc.citation.issue3Aen_US
dc.citation.spage1566en_US
dc.citation.epage1569en_US
dc.contributor.department應用化學系zh_TW
dc.contributor.departmentDepartment of Applied Chemistryen_US
dc.identifier.wosnumberWOS:000236191900018-
dc.citation.woscount0-
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