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dc.contributor.author張志睿en_US
dc.contributor.authorChang, Chih-Juien_US
dc.contributor.author劉柏村en_US
dc.contributor.authorLiu, Po-Tsunen_US
dc.date.accessioned2015-11-26T00:57:09Z-
dc.date.available2015-11-26T00:57:09Z-
dc.date.issued2015en_US
dc.identifier.urihttp://140.113.39.130/cdrfb3/record/nctu/#GT070250519en_US
dc.identifier.urihttp://hdl.handle.net/11536/126951-
dc.language.isoen_USen_US
dc.subject鎢摻雜氧化銦zh_TW
dc.subject雙主動層結構zh_TW
dc.subject透明薄膜電晶體zh_TW
dc.subject顯示器zh_TW
dc.subjectTungsten Doped Indium Oxideen_US
dc.subjectbi-layer structreen_US
dc.subjectThin Film Transistorsen_US
dc.subjectTFT-LCDen_US
dc.title非晶態鎢摻雜氧化銦透明薄膜電晶體技術之研究zh_TW
dc.titleStudy on Transparent Amorphous Tungsten Doped Indium Oxide Thin Film Transistors Technologyen_US
dc.typeThesisen_US
dc.contributor.department光電工程研究所zh_TW
顯示於類別:畢業論文